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SCADA Patents: Top Companies & Filing Trends 2026

SCADA Patents: Top Companies & Filing Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/scada-and-supervisory-systems-patent-landscape-patent-landscape/ · Patsnap · data cut-off 2026-08-31 · downloaded from the live page
Patent Landscape · Industrial Automation & Control
SCADA and Supervisory Control Patents: Who Leads and Where Filing Is Slowing
  • 52.0% concentration. The top 5 assignees hold 52.0% of the 14,878 records in scope, with the leader alone accounting for 6,010 of them.
  • 41% filing decline. Filings fell from 809 in 2021 to 478 in 2024 — a 41% drop across the last three fully-published years.
  • Metrology, not control loops, dominates the claims. 36.3% of records classify under photolithography and metrology (G03F), well ahead of core control-systems claims (G05B) at 11.1%.
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14.9K
Published Records
52%
Top-5 Share of All Records
-41%
Filing Growth 2021→2024
US
Leading Jurisdiction

Filing growth compares 2021 (809 records) with 2024 (478) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 14,878 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this landscape covers

This landscape covers 14,878 published records matching supervisory control system, SCADA network and industrial SCADA terminology, filtered to filings that also reference control parameters, process variables, controller output, equipment state or industrial network claims. The scope spans filings from 2015 through the 2026 data cut-off, though publication lag means the most recent one to two years are still filling in.

The corpus is weighted more heavily toward semiconductor lithography metrology than toward classic plant-floor SCADA, which shapes how the assignee ranking and citation leaders should be read: a large filer at the top of the list may hold most of its portfolio in substrate-measurement and lithographic apparatus claims rather than in generic industrial supervisory control.

Records by filing year and IPC subclass
  1. 1ASML NETHERLANDS BV6,010
  2. 2KK TOSHIBA517
  3. 3ASML HLDG NV443
  4. 4HITACHI LTD429
  5. 5PANASONIC ELECTRIC WORKS CO LTD332
  6. 6MITSUBISHI ELECTRIC CORP290
  7. 7ROCKWELL AUTOMATION TECH INC236
  8. 8NEC CORP228
  9. 9FUJITSU LTD179
  10. 10SCHLUMBERGER TECH CORP163
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Data & Trends

Filing trends and technology composition

The 14,878 records in scope span 2015 through the 2026 cut-off, with publication lag meaning the most recent one to two years understate actual filing activity.

Filing activity has cooled from its 2020 peak

Filings rose to a peak of 896 in 2020, then filing volume fell from 809 in 2021 to 478 in 2024, a 41% decline over that three-year span. 2025 and 2026 figures are still filling in as publications catch up with filing dates, so they should not be read as a continued decline on their own.

Filing activity has cooled from its 2020 peak02505007501,000865201720182019896202020212022202320242025852026Most recent year is partial — publication lag means later filings are not yet visible.

Photolithography and metrology dominate the classification mix

G03F (photolithography & photomechanics) touches 36.3% of the 14,878 records in scope, well ahead of G05B control systems (11.1%), G06F data processing (10.3%) and G01N material analysis (10.0%). Because records can carry multiple IPC classes, these shares add to more than 100% of the record total.

Photolithography and metrology dominate the classification mixG03F · Photolithography & photomechan…5,40336.3%G05B · Control & regulating systems1,65011.1%G06F · Electric digital data processi…1,52610.3%G01N · Material analysis & testing1,48810.0%H04Q · Switching & selecting1,1497.7%H04L · Digital information transmissi…1,0597.1%H02J · Power supply & grid systems7805.2%G02B · Optical elements & systems7274.9%Other11,37776.5%

Shares are the percentage of the 14,878 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

Most-cited records and a representative filing

Representative filing
US20070147232A12007-06-28

Redundant supervisory control system, and redundancy switching method of the same

KABUSHIKI KAISHA TOSHIBA

Filed by Toshiba and published in 2007, this record claims a redundant supervisory control system built from paired controllers, first and second loop interface units, and communication cables connecting those units in a circular loop, together with a method for switching between them on failure. The design keeps remote I/O apparatus accessible even when failures occur in more than one location.Abstract text is excerpted directly from the published filing.

US20070147232A1 — patent drawing 1US20070147232A1 — patent drawing 2
View full record
Highest-citation records in scope
#Publication no.Patent titleCitations
1US20120044470A1Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method1,615
2US20110102753A1Apparatus and Method of Measuring a Property of a Substrate1,542
3US20110027704A1Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells1,360
4US20110043791A1Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate1,280
5WO2009106279A1Metrology method and apparatus, lithographic apparatus, and device manufacturing method1,055
6US20110249244A1Lithographic Focus and Dose Measurement Using A 2-D Target989
7US20160161863A1Metrology method, computer product and system952
8US20110026032A1Method of Assessing a Model of a Substrate, an Inspection Apparatus and a Lithographic Apparatus950
9WO2011012624A1Metrology method and apparatus, lithographic system, and lithographic processing cell876
10US20130162996A1Inspection Method and Apparatus, and Lithographic Apparatus833

Citation counts inside a searched corpus skew toward older records; treat them as a signal of influence within this dataset, not of current technical importance.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Signals

What the filing data signals

Three patterns stand out once the records are broken down by classification, geography and citation weight: a concentrated top of the field, a metrology-heavy claim mix, and thin collaborative filing.

Concentration
52.0%
of 14,878 records

Filing sits with a small group of leaders

The top 5 assignees combined hold 52.0% of all records in scope, and the top 10 extend that to 59.3%. That leaves a long tail of single- and few-filing entrants competing for the remaining claim space.

Based on the full 100-company ranking
Composition
36.3%
of records classify G03F

Photolithography metrology outweighs control-loop claims

G03F touches over a third of the dataset, more than three times the share of core supervisory control claims under G05B (11.1%). Readers targeting plant-floor SCADA should filter for the control and network classes specifically.

IPC shares overlap; records carry multiple classes
Momentum
-41%
2021 to 2024

Filing volume has cooled from its 2020 peak

After peaking at 896 filings in 2020, volume fell to 478 by 2024. The two most recent years are still incomplete due to publication lag and should not be read as a continuation of that decline.

2024 is the most recent complete year
Collaboration
10
co-assignee pairs

Joint filing is rare across this field

Only 10 co-assignee pairs appear across the entire dataset, and the strongest of those sit inside a single corporate family plus its closest university partners, rather than spread across the field.

Counted across all 14,878 records
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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the field is open

The ranked leaders account for a majority of filing volume, but the concentration sits mostly in metrology and control-systems claims rather than spreading evenly across every branch of supervisory control.

Scale leader
6,010
records

A single filer dominates the ranking

The leading assignee's record count alone exceeds the combined total of the next several entrants, built substantially around lithographic metrology and substrate-measurement filings rather than narrow SCADA control logic.

Largest single share in the 100-company ranking
Momentum shift
-87% YoY
latest year

Leading filers are pulling back on recent filings

The top assignee's latest-year filing count fell 87% year-on-year, and other leaders in the ranking show similarly steep declines. This aligns with the broader publication-lag effect rather than a confirmed exit from the field.

Recent-year figures are still incomplete
Collaboration
189
strongest co-assignee pair

Joint filings cluster around a single corporate family

The strongest co-assignee relationship in the dataset links two entities within the same corporate group, with university partnerships appearing only at much smaller scale.

10 co-assignee pairs recorded in total
🔍
Under-claimed sub-areas worth watching
These branches show lower filing density relative to the dominant metrology and control-systems clusters.
Grid-aware supervisory controlOptical-sensing feedback loopsNetwork-layer failover topologiesCross-domain sensor-to-controller pipelines
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
ASML Netherlands B.V.22-87%
Schlumberger Technology Corporation2-50%
ASML Holding N.V.1-80%
Toshiba Corporation0
Hitachi, Ltd.0
Panasonic Electric Works Co., Ltd.0
Mitsubishi Electric Corporation0
NEC Corporation0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this next

The figures here describe the field as it stands; deciding where to file, litigate or partner requires drilling into specific claims and specific competitors.

Check freedom-to-operate against the leaders

With over half of records held by a handful of assignees, a targeted claim-scope review against the top filers is a faster first step than a broad prior-art search.

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Track momentum, not just volume

Recent-year declines are partly a publication-lag artefact. Watching filing momentum by assignee over the next reporting cycle will separate real pullbacks from reporting delay.

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Explore the under-claimed branches

Grid-integration and optical-sensing feedback loops show lower filing density than the dominant clusters, and may offer more room for an independent claim.

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Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Frequently asked questions

Answers are grounded in the same dataset. Derived from a Patsnap search on SCADA & Supervisory Systems Patent Landscape covering 2015–2026, data cut-off 2026-08-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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