SCADA Patents: Top Companies & Filing Trends 2026
- 52.0% concentration. The top 5 assignees hold 52.0% of the 14,878 records in scope, with the leader alone accounting for 6,010 of them.
- 41% filing decline. Filings fell from 809 in 2021 to 478 in 2024 — a 41% drop across the last three fully-published years.
- Metrology, not control loops, dominates the claims. 36.3% of records classify under photolithography and metrology (G03F), well ahead of core control-systems claims (G05B) at 11.1%.
Filing growth compares 2021 (809 records) with 2024 (478) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 14,878 records in scope (CR5), not by the ranked leaders only.
What this landscape covers
This landscape covers 14,878 published records matching supervisory control system, SCADA network and industrial SCADA terminology, filtered to filings that also reference control parameters, process variables, controller output, equipment state or industrial network claims. The scope spans filings from 2015 through the 2026 data cut-off, though publication lag means the most recent one to two years are still filling in.
The corpus is weighted more heavily toward semiconductor lithography metrology than toward classic plant-floor SCADA, which shapes how the assignee ranking and citation leaders should be read: a large filer at the top of the list may hold most of its portfolio in substrate-measurement and lithographic apparatus claims rather than in generic industrial supervisory control.
Filing trends and technology composition
The 14,878 records in scope span 2015 through the 2026 cut-off, with publication lag meaning the most recent one to two years understate actual filing activity.
Filing activity has cooled from its 2020 peak
Filings rose to a peak of 896 in 2020, then filing volume fell from 809 in 2021 to 478 in 2024, a 41% decline over that three-year span. 2025 and 2026 figures are still filling in as publications catch up with filing dates, so they should not be read as a continued decline on their own.
Photolithography and metrology dominate the classification mix
G03F (photolithography & photomechanics) touches 36.3% of the 14,878 records in scope, well ahead of G05B control systems (11.1%), G06F data processing (10.3%) and G01N material analysis (10.0%). Because records can carry multiple IPC classes, these shares add to more than 100% of the record total.
Shares are the percentage of the 14,878 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
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Try EurekaMost-cited records and a representative filing
Redundant supervisory control system, and redundancy switching method of the same
Filed by Toshiba and published in 2007, this record claims a redundant supervisory control system built from paired controllers, first and second loop interface units, and communication cables connecting those units in a circular loop, together with a method for switching between them on failure. The design keeps remote I/O apparatus accessible even when failures occur in more than one location.Abstract text is excerpted directly from the published filing.


| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US20120044470A1 | Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method | 1,615 |
| 2 | US20110102753A1 | Apparatus and Method of Measuring a Property of a Substrate | 1,542 |
| 3 | US20110027704A1 | Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells | 1,360 |
| 4 | US20110043791A1 | Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate | 1,280 |
| 5 | WO2009106279A1 | Metrology method and apparatus, lithographic apparatus, and device manufacturing method | 1,055 |
| 6 | US20110249244A1 | Lithographic Focus and Dose Measurement Using A 2-D Target | 989 |
| 7 | US20160161863A1 | Metrology method, computer product and system | 952 |
| 8 | US20110026032A1 | Method of Assessing a Model of a Substrate, an Inspection Apparatus and a Lithographic Apparatus | 950 |
| 9 | WO2011012624A1 | Metrology method and apparatus, lithographic system, and lithographic processing cell | 876 |
| 10 | US20130162996A1 | Inspection Method and Apparatus, and Lithographic Apparatus | 833 |
Citation counts inside a searched corpus skew toward older records; treat them as a signal of influence within this dataset, not of current technical importance.
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Three patterns stand out once the records are broken down by classification, geography and citation weight: a concentrated top of the field, a metrology-heavy claim mix, and thin collaborative filing.
Filing sits with a small group of leaders
The top 5 assignees combined hold 52.0% of all records in scope, and the top 10 extend that to 59.3%. That leaves a long tail of single- and few-filing entrants competing for the remaining claim space.
Photolithography metrology outweighs control-loop claims
G03F touches over a third of the dataset, more than three times the share of core supervisory control claims under G05B (11.1%). Readers targeting plant-floor SCADA should filter for the control and network classes specifically.
Filing volume has cooled from its 2020 peak
After peaking at 896 filings in 2020, volume fell to 478 by 2024. The two most recent years are still incomplete due to publication lag and should not be read as a continuation of that decline.
Joint filing is rare across this field
Only 10 co-assignee pairs appear across the entire dataset, and the strongest of those sit inside a single corporate family plus its closest university partners, rather than spread across the field.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to scada & supervisory systems patent landscape, with the prior art for and against each one.
Who is filing, and where the field is open
The ranked leaders account for a majority of filing volume, but the concentration sits mostly in metrology and control-systems claims rather than spreading evenly across every branch of supervisory control.
A single filer dominates the ranking
The leading assignee's record count alone exceeds the combined total of the next several entrants, built substantially around lithographic metrology and substrate-measurement filings rather than narrow SCADA control logic.
Leading filers are pulling back on recent filings
The top assignee's latest-year filing count fell 87% year-on-year, and other leaders in the ranking show similarly steep declines. This aligns with the broader publication-lag effect rather than a confirmed exit from the field.
Joint filings cluster around a single corporate family
The strongest co-assignee relationship in the dataset links two entities within the same corporate group, with university partnerships appearing only at much smaller scale.
| Assignee | Recent year | YoY |
|---|---|---|
| ASML Netherlands B.V. | 22 | -87% |
| Schlumberger Technology Corporation | 2 | -50% |
| ASML Holding N.V. | 1 | -80% |
| Toshiba Corporation | 0 | — |
| Hitachi, Ltd. | 0 | — |
| Panasonic Electric Works Co., Ltd. | 0 | — |
| Mitsubishi Electric Corporation | 0 | — |
| NEC Corporation | 0 | — |
Where to take this next
The figures here describe the field as it stands; deciding where to file, litigate or partner requires drilling into specific claims and specific competitors.
Check freedom-to-operate against the leaders
With over half of records held by a handful of assignees, a targeted claim-scope review against the top filers is a faster first step than a broad prior-art search.
Run a claim check in EurekaTrack momentum, not just volume
Recent-year declines are partly a publication-lag artefact. Watching filing momentum by assignee over the next reporting cycle will separate real pullbacks from reporting delay.
Set up momentum tracking in EurekaExplore the under-claimed branches
Grid-integration and optical-sensing feedback loops show lower filing density than the dominant clusters, and may offer more room for an independent claim.
Explore white space in EurekaFrequently asked questions
Filing in this dataset is concentrated at the top: the leading assignee alone accounts for 6,010 of the 14,878 records in scope, and the top 5 assignees combined hold 52.0% of all records. The leader's portfolio is weighted heavily toward lithographic metrology and substrate-measurement technology rather than plant-floor SCADA logic in the narrow industrial sense, so readers focused specifically on process-control SCADA should look past the raw ranking to the IPC composition for context. The ranking itself covers 100 companies and is not a top-50 or top-100 cutoff — it is the full list the dataset returns.
Filings peaked in 2020 at 896 and fell from 809 in 2021 to 478 in 2024, a 41% drop over that three-year window. That said, publication typically lags filing by around 18 months, so 2025 and 2026 figures in the trend line are still incomplete and should not be read as evidence the field itself is winding down. The safest read is that filing activity cooled through the early 2020s relative to its 2020 peak, based on the years for which the data is complete.
Photolithography and photomechanics (G03F) is the single largest classification, touching 36.3% of the 14,878 records in scope, reflecting how much of this corpus intersects with semiconductor manufacturing metrology rather than generic industrial control. Control and regulating systems (G05B) at 11.1% and electric digital data processing (G06F) at 10.3% are the next largest clusters, followed closely by material analysis and testing (G01N) at 10.0%. Because a single record can carry several IPC classes, these percentages overlap and should not be summed.
Power supply and grid systems (H02J) and optical elements and systems (G02B) show the lowest shares among the major classes covered here, at 5.2% and 4.9% of the 14,878 records respectively, suggesting comparatively less claim density than the dominant photolithography and control-systems clusters. Co-assignee collaboration is also rare across the dataset, with only 10 recorded co-assignee pairs, meaning joint industry-academic filings in adjacent sensing-and-control combinations remain uncommon. Teams looking for open claim space should look specifically at supervisory control tied to grid-state inputs or optical-sensing feedback, rather than at the core metrology or control-loop claims already held by the leading filers.
US20070147232A1, filed by Toshiba and published in 2007, claims a specific redundant supervisory control architecture built from paired controllers, loop interface units, and communication cables wired into a circular loop, with a redundancy-switching method for that topology. It blocks designs that reproduce that specific circular-loop redundancy structure, not redundancy in supervisory control generally, so systems using star, mesh, or software-defined failover approaches sit outside its literal claim scope. Any freedom-to-operate check involving redundant SCADA architectures should treat this record as a reference point for the circular-loop topology specifically, alongside newer filings in the same design space.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.
Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.