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Selective Laser Melting Patent Landscape 2026

Selective Laser Melting Patent Landscape 2026
Competitive Landscape

Selective Laser Melting Patent Landscape in 2026

Selective laser melting is a maturing, heavily concentrated field: General Electric alone accounts for the largest single share among the top hundred filers, and the top five together hold 25% of that group’s combined output. Annual filing volume peaked in 2018 and has eased since, signalling that the core process layer is consolidating while application-specific branches — notably alloy development and process control — remain comparatively open.

16,958
Patent families in scope
25%
Top-5 share of top-100 filers
-32%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

General Electric leads a concentrated but multi-tier field

General Electric holds the top position with 1,228 patent families, well ahead of second-ranked Renishaw PLC at 387 and third-ranked Siemens Energy Global GmbH & Co KG at 366, establishing a clear lead tier that is roughly three times larger than the nearest challenger.

The top five filers — General Electric, Renishaw, Siemens Energy Global, Align Technology, and Peridot Print — together account for 25% of the hundred largest filers’ combined total, indicating meaningful but not monopolistic concentration; a substantial second tier from rank six onward remains competitively active.

Leading applicants
#ApplicantPatent familiesShare
1General Electric Company1,228
2Renishaw PLC387
3SIEMENS ENERGY GLOBAL GMBH & CO KG366
4Align Technology Inc352
5Peridot Print LLC297
6Divergent Technologies Inc290
7Siemens AG281
8Applied Materials Inc278
9Velo3D Inc256
10Hewlett Packard Development Company LP250
#ApplicantPatent familiesShare
11The Boeing Company233
12Nikon SLM Solutions AG226
13GE Infrastructure Technology LLC188
14RTX Corporation185
15Constellium Technology Center (C-TEC)171
16South China University of Technology166
17MTU Aero Engines GmbH159
18HUAZHONG UNIV OF SCI & TECH156
19General Electric Technology GmbH153
20Proterial Ltd148
↗ Hover a row · click a company to ask Eureka

General Electric’s position, reinforced by its GE Infrastructure Tech and General Electric Tech subsidiaries also appearing in the top twenty, suggests a coordinated portfolio strategy spanning process equipment, materials, and end-use components — raising the barrier for new entrants targeting core SLM process patents specifically.

Filings from approximately 2023 onward are subject to publication lag and will increase as pending applications publish; apparent recent-year counts should not be read as the final activity level. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

A 2018 peak, a broadening application mix, and sparse process-control coverage

The annual filing trend reveals a field that crested in 2018 and has contracted on a multi-year basis, while the IPC composition shows that activity has spread well beyond core additive manufacturing classes into alloys, medical devices, dental, and aerospace sub-domains.

Annual filing trend

Annual families reached a peak of 2,595 in 2018 before declining through 2022–2024; figures for 2024–2026 are substantially under-counted due to publication lag and should not be interpreted as the true recent pace. The multi-year contraction from the 2018 peak is nevertheless real and reflects consolidation of core process IP.

Annual filing trendAnnual values from 2017 to 2026, peaking at 2,595 in 2018.2,14420172,59520182,35820192,33120202,02420211,67320221,51620231,38820248442025852026↗ Hover for values · click a bar to ask Eureka

Technology composition

B33Y (additive manufacturing) and B22F (powder metallurgy) dominate the branch mix, confirming that most activity addresses core process and powder-handling claims. Adjacent branches — B23K (welding and brazing), C22C (alloys), and G05B (control systems) — carry meaningfully lower shares, flagging under-served intersections between SLM and materials science or process automation.

Technology compositionB33Y · Additive manufacturing (3D printing) leads with 18,539; B22F · Powder metallurgy 13,270.B33Y · Additive manufact…18,539B22F · Powder metallurgy13,270B29C · Shaping of plastics7,659B23K · Welding, solderin…3,248C22C · Alloys3,115B28B · Shaping clay & ce…902C22F · Non-ferrous metal…639G05B · Control & regulat…631↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
WO2019025471A1Published 2019-02-07

A nozzle containing at least one static mixing ele…

Basf SE

The invention relates to a nozzle containing at least one static mixing element, wherein the nozzle and the at least one static mixing element are produced as a single- component object by a selective laser melting (SLM) process. The invention further relates to a process for producing a three-dimensional green body by a fused filament 0fabrication process… (excerpt from the patent abstract)

A nozzle containing at least one static mixing ele… — patent drawingA nozzle containing at least one static mixing ele… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Method and apparatus for 3D printing by selective …508
2Procedure and apparatus for in-situ monitoring and…433
3Direct fabrication of orthodontic appliances with …355
4Method of using a powered stapling device337
5Implant device and method for manufacture336
6Patient-specific medical procedures and devices, a…310
7Powder dispensing apparatus and method301
8Apparatuses, systems and methods for three-dimensi…266

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment

Four structural observations — maturity, concentration, collaboration patterns, and geographic reach — together define where new entrants face the highest barriers and where targeted investment may still find room.

Decline

Post-peak consolidation phase

The lifecycle stage is Decline: annual filing volume has eased back from the 2018 peak, with the multi-year window showing a 32% contraction. Core process claims are densely occupied, so incremental process patents face high prior-art density. R&D differentiation is more viable in application-specific sub-domains — dental, orthopaedic implants, heat exchangers — where filing intensity is lower.

Post-peak
Concentration

Three-to-one lead-tier gap, active second tier

General Electric at 1,228 patent families is roughly three times larger than Renishaw at 387 and Siemens Energy Global at 366. Despite this gap, ranks six through twenty are closely bunched — Divergent Technologies, Siemens AG, Applied Materials, Velo3D, and Hewlett Packard Development are each within a 40-family range — meaning the second tier remains genuinely competitive and accessible to well-resourced new entrants.

High concentration
Collaboration

GE–Concept Laser axis dominates co-filing; HP–academic links notable

The most active co-filing pair is General Electric and Concept Laser with 50 jointly filed families, consistent with GE’s acquisition of Concept Laser. Hewlett Packard Development co-filed 16 families with Atlantic Research Institute and 9 with Nanyang Technological University, signalling an active academic engagement strategy. Align Technology and Cubicure co-filed 6 families, reflecting a materials-plus-application collaboration in dental.

Acquisition-led
Geography

US-dominant, China rising, Europe well-represented

The United States leads jurisdictional coverage, followed by China and Europe (EPO). Germany and Japan are the next largest individual national offices. WIPO (PCT) filings indicate that the leading applicants are actively seeking multi-jurisdiction protection. China’s position as the second-largest jurisdiction signals growing domestic competitive pressure from Chinese filers such as South China University of Technology and Huazhong University of Science and Technology.

US-led, China growing
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Top collaboration links
ApplicantCollaboratorCo-filings
General Electric CompanyConcept Laser GmbH50
Hewlett Packard Development Company LPAtlantic Research Institute16
Concept Laser GmbHGE ADDITIVE GERMANY GMBH11
Hewlett Packard Development Company LPNanyang Technological University9
Concept Laser GmbHKU Leuven (Catholic University of Leuven)6
Align Technology IncCubicure GmbH6
General Electric CompanyCarpenter Technology Corporation5
General Electric CompanyOerlikon Management AG4
Siemens AGSiemens Industry Software GmbH4
Siemens AGSiemens (China) Co Ltd4

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Collaboration counts reflect co-applicant pairs within the selective laser melting corpus.Explore insights →
Leaders

General Electric and Align Technology: divergent trajectories at the top

Among the highest-volume filers, momentum has split sharply: incumbents with core process portfolios have contracted while application-focused challengers have accelerated, most notably in dental and structural components.

Leader · General Electric Co

General Electric Co

General Electric leads with 1,228 patent families, concentrated in additive manufacturing process (B33Y10, B33Y30) and plastics shaping (B29C64) — reflecting broad process and equipment coverage. Momentum has contracted sharply (▼ –59% recent versus prior three-year period), consistent with a maturing core portfolio. GE’s affiliated entities GE Infrastructure Tech and General Electric Tech GmbH add further depth to its overall position.

patent families: 1,228
Challenger · Align Technology Inc

Align Technology Inc

Align Technology ranks fourth overall with 352 patent families and is the fastest-growing major incumbent, with recent filings up ▲ +112% versus the prior three-year period. Its technology focus is tightly application-specific: dental and oral hygiene (A61C7) and additive manufacturing end-products (B33Y80), supported by a co-filing relationship with Cubicure. This trajectory suggests deliberate vertical positioning in dental additive manufacturing rather than broad process coverage.

patent families: 352
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Access rankings, momentum scores, and technology emphasis for all top-100 filers in selective laser melting.
Renishaw PLCVelo3D Inc+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
General Electric Company170▼ -59%
Hewlett Packard Development Company LP23▼ -89%
Siemens AG15▼ -85%
Concept Laser GmbH58▼ -65%
Renishaw PLC48▼ -55%
Align Technology Inc178▲ +112%
Divergent Technologies Inc95▲ +22%
Velo3D Inc74▲ +164%
Source: PatSnap Eureka. Applicant ranking and momentum figures are at the patent-family level.Explore players →
Adjacent Branches

Under-served branches adjacent to core SLM activity

Five IPC branches appear as lower-share zones relative to the dominant B33Y and B22F classes; among these, welding/brazing process integration, alloy development, and closed-loop process control stand out as technically adjacent to SLM with plausible entry paths.

C22C · Alloys — SLM-optimised material compositions

C22C carries a comparatively low share of the corpus despite alloy selection being critical to SLM part quality. Most alloy-related claims appear as supporting claims within broader additive manufacturing families rather than as primary alloy-composition patents. An entrant with deep metallurgical capability could stake primary claims on SLM-specific alloy compositions — particularly for high-entropy alloys, nickel superalloys, and titanium variants — where the intersection with laser processing parameters is still sparsely claimed. Academic filers such as Huazhong University of Science and Technology and South China University of Technology are active in this space but leave room for industrial-grade composition patents.

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G05B · Control and regulating systems — in-process monitoring and closed-loop control

G05B is one of the smallest branches in the corpus despite in-situ monitoring being a cited focus of the second-most-cited patent in the corpus (in-situ monitoring and feedback). Closed-loop melt-pool control, layer-by-layer defect detection, and real-time parameter adjustment remain comparatively sparse relative to their technical importance. This branch has plausible entry paths for players with sensor integration or industrial control expertise — including established process-control vendors not yet prominent in the SLM ranking — and aligns with the growing demand for qualification and certification of additively manufactured aerospace and medical parts.

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B23K · Welding, soldering & brazing — SLM process integrationC22F · Non-ferrous metal treatment — post-process heat treatment+ more
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Source: PatSnap Eureka. Branch shares are computed at the patent-record level relative to the top branches in the selective laser melting corpus.Explore emerging →
Route Matrix

How leading applicants differ by technology route

Strength of each leader across the main technology routes.

PlayerB33Y 10 · Additive manufacturing (3D printing)B22F 10 · Powder metallurgyB33Y 30 · Additive manufacturing (3D printing)B29C 64 · Shaping of plasticsB22F 3 · Powder metallurgy
General Electric CompanyStrong · 923Strong · 470Strong · 719Strong · 666Strong · 618
Concept Laser GmbHStrong · 237Strong · 185Strong · 300Strong · 329Moderate · 92
Renishaw PLCStrong · 198Strong · 143Strong · 227Strong · 213Strong · 181
Siemens AGStrong · 252Moderate · 90Strong · 152Strong · 186Strong · 267
Hewlett Packard Development Company LPStrong · 279AbsentStrong · 224Strong · 421Absent
Velo3D IncStrong · 146AbsentStrong · 184Strong · 128Strong · 122
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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