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SHJ a-Si:H Passivation Patent Snapshot 2026

SHJ a-Si:H Passivation Patent Snapshot 2026
Evidence Snapshot
SHJ a-Si:H Passivation Patent Snapshot in 2026

The SHJ a-Si:H passivation patent space is compact and research-institution-led, with IBM and four European universities collectively holding the majority of documented filings. Annual volume peaked in 2017 and has since plateaued, signaling a field transitioning toward selective deepening rather than broad land-grabbing.

34
Patent families in scope
52%
Top visible applicants share
+11%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

IBM leads a research-institution-dominated field with concentrated IP

International Business Machines Corporation heads the applicant ranking with 11 patent records, followed by EPFL with 6, and KU Leuven and IMEC each with 5 — all four European institutions anchoring the second tier.

The top five filers account for 52% of the ranked applicants visible in this query’ combined total, indicating a high concentration for a field of this size. The tier gap between IBM at the top and the next cluster is notable, though EPFL, KU Leuven, IMEC, and TU Delft together represent a strong academic bloc.

Leading applicants
#ApplicantPatent recordsShare
1International Business Machines Corporation11
2Ecole Polytechnique Federale de Lausanne (EPFL)6
3KU Leuven5
4IMEC VZW5
5Delft University of Technology4
6Tongwei Solar (Jintang) Co., Ltd.3
7Advanced Solar Technology Institute Xuancheng2
8Applied Materials Inc.2
9Crystal Solar Inc.1
10State Power Investment Corporation Research Institute1
#ApplicantPatent recordsShare
11Soochow University1
12DR RANADHEER DONTHI1
13SVAGOS TECHNIK INC1
14The Trustees of Princeton University1
15Henan University1
16Energy Research Centre of the Netherlands (ECN)1
17DR M DHAMODHARA NAIDU1
18DR A SRINIVASA PRADEEP1
193SUN S.r.l.1
20Nanchang University1
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IBM’s lead position, combined with a predominantly H01L 31 technology focus shared by all top applicants, suggests the foundational photovoltaic device architecture is well-staked. Entrants are more likely to differentiate through process routes (deposition chemistry, nanotechnology) than core junction design.

Filings from 2024 onward are subject to publication lag and should be treated as provisional; the effective evidence snapshot should be read through 2022–2023 data. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

A 2017 filing peak followed by plateau; semiconductor device class dominates the technology mix

The annual trend and IPC composition together show a field that established its core IP base early and has since seen episodic rather than sustained follow-on activity.

Annual filing trend

A pronounced peak of 13 filings in 2017 is followed by a multi-year trough and a modest recovery in 2021–2022. Figures for 2024 and 2025 reflect publication lag and should not be read as a further decline. The overall recent-window growth remains positive at 11%, but annual volume has clearly eased from its 2017 high.

Annual filing trendAnnual values from 2017 to 2026, peaking at 13 in 2017.132017120182201912020620215202242023120241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

H01L (Semiconductor devices) is visible in the IPC mix with 52 patent records, reflecting the core device-architecture orientation of the field. C23C (Coating and surface deposition) and H10K (Organic semiconductors) are sparse adjacent branches at 3 and 2 records respectively, pointing to process-chemistry and hybrid-device angles that remain lightly covered.

Technology compositionH01L · Semiconductor devices leads with 52; C23C · Coating & surface deposition 3.H01L · Semiconductor dev…52C23C · Coating & surface…3H10K · Organic semicondu…2B82Y · Nanotechnology ap…1C01G · Compounds of othe…1H10F · Photovoltaic & li…1H10P1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20090293948A1Published 2009-12-03

Method of manufacturing an amorphous/crystalline s…

Stichting Energieonderzoek Centrum Nederland

A method for manufacturing a solar cell includes<ul class="uspto-list"><li class="uspto-list-item"><ul class="uspto-list"><li class="uspto-list-item">providing a first conductivity type doped crystalline silicon wafer,</li><li class="uspto-list-item">depositing on one side a first intrinsic a-Si:H buffer layer, followed by a second conductivity type doped… (excerpt from the patent abstract)

Method of manufacturing an amorphous/crystalline s… — patent drawingMethod of manufacturing an amorphous/crystalline s… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Method of manufacturing an amorphous/crystalline s…97
2Silicon heterojunction solar cells and methods of …35
3Silicon heterojunction photovoltaic device with wi…33
4一种硅异质结太阳能电池及其制作方法19
5一种晶硅异质结太阳电池的发射极结构17
6Method of patterning an amorphous semiconductor la…15
7一种晶硅异质结太阳能电池13
8Hole-blocking TiO2/Silicon Heterojunction for Sili…13

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · IBM

International Business Machines Corporation

IBM holds 11 patent records, the largest position in the corpus, focused primarily on H01L 31 (9 records) and H01L 21 (3 records) — the core semiconductor device and fabrication process classes for SHJ passivation. A single H10P 95 record suggests exploratory work at the boundary of novel device physics. No momentum data in evidence indicates a stable rather than accelerating position.

patent records: 11
Challenger · EPFL

Ecole Polytechnique Federale de Lausanne

EPFL holds 6 patent records, all concentrated in H01L 31, reflecting a focused passivation-science orientation consistent with its role as a leading photovoltaic research institute. As a federal research university, EPFL’s IP is likely available for licensing, which may make it a more accessible IP source for industrial players than IBM’s corporate portfolio.

patent records: 6
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
KU LeuvenIMEC VZW+ more
Unlock full assignee analysis →
Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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