SHJ Anti-Reflective Texturing Patent Snapshot 2026
The SHJ anti-reflective and texturing patent space is a compact, maturing field dominated by semiconductor-device filings concentrated in China and the United States. International Business Machines Corporation leads by filing count, though the field is broadly shared across industry players, universities, and research institutes with no single entity holding overwhelming control.
A fragmented field with IBM at the front and broad academic participation
International Business Machines Corporation holds the leading position among ranked filers, followed by Jiangxi Electric Power Investment New Energy Technology Co., Ltd. and Xifeng 2D Fujian Material Tech Co., Ltd. The top five filers collectively account for thirty-nine percent of the combined total of the ranked applicants visible in this query, indicating a moderately fragmented visible assignee structure rather than a tightly consolidated one.
No single applicant commands a visible share. The ranking spreads across Chinese manufacturers, US industrial labs, European research institutes, and university groups, reflecting the multi-stakeholder nature of SHJ surface engineering research. The gap between the first-ranked applicant and the next tier is noticeable but not prohibitive for challengers.
| # | Applicant | Patent records | Share |
|---|---|---|---|
| 1 | International Business Machines Corporation | 5 | |
| 2 | Jiangxi Electric Power Investment New Energy Technology Co., Ltd. | 4 | |
| 3 | Xifeng 2D Fujian Material Tech Co., Ltd. | 3 | |
| 4 | The Arizona Board of Regents on behalf of the University of Arizona | 3 | |
| 5 | Tongwei Solar (Jintang) Co., Ltd. | 2 | |
| 6 | Jiangxi Changda High-Tech Energy Materials Technology Co., Ltd. | 2 | |
| 7 | Ecole Polytechnique Federale de Lausanne (EPFL) | 2 | |
| 8 | KU Leuven (Katholieke Universiteit Leuven) | 2 | |
| 9 | IMEC (Interuniversity Microelectronics Centre) | 2 | |
| 10 | HRL Laboratories, LLC | 2 |
| # | Applicant | Patent records | Share |
|---|---|---|---|
| 11 | Electric Power Investment New Energy Technology (Longgang) Co., Ltd. | 2 | |
| 12 | Jiujiang Dengtukuo Machinery Co., Ltd. | 1 | |
| 13 | Jetion Solar Holdings | 1 | |
| 14 | JIANGSU UNIV OF SCI & TECH | 1 | |
| 15 | Stichting Energieonderzoek Centrum Nederland (ECN) | 1 | |
| 16 | Nanchang University | 1 | |
| 17 | ENN Solar Energy Co., Ltd. | 1 | |
| 18 | Gold Stone (Fujian) Energy Co., Ltd. | 1 | |
| 19 | Institute of Physics, Chinese Academy of Sciences | 1 | |
| 20 | GS Solar China Company | 1 |
IBM’s position at the top, combined with strong representation from EPFL, IMEC, and KU Leuven, signals that foundational process IP remains concentrated in established research organizations. Chinese solar manufacturers such as Tongwei Solar (Jintang) and Jiangxi Electric Power Investment New Energy Technology are building industrial positions, suggesting that commercialization-oriented filings are now entering a field previously shaped by research institutions.
Patent publications from the most recent eighteen to twenty-four months are typically under-counted due to publication lag; apparent absence of filings in 2024–2026 reflects this delay rather than a cessation of activity.
Annual volume has plateaued and H01L semiconductor filings dominate the technology mix
The filing trend chart captures annual activity from 2017 onward, while the technology composition chart maps the IPC branch distribution across the corpus. Together they show a field that peaked in 2017 and has since oscillated at lower volumes, with semiconductor-device classification accounting for the overwhelming majority of filings.
Annual filing trend
Annual filings peaked at nine records in 2017 and have since fluctuated between two and five per year through 2023, consistent with a plateau. Zero values for 2024–2026 reflect publication lag and should not be read as a real decline in activity.
↗ Hover for values · click a bar to ask EurekaTechnology composition
H01L semiconductor devices accounts for the large majority of classified records, establishing it as the primary technical route. Crystal growth (C30B) and other electric solid-state devices (H10N) each account for a small share, while coating and surface deposition (C23C) is the most sparsely represented branch — pointing to potential under-coverage of deposition-process approaches.
↗ Hover for values · click a bar to ask EurekaHighly cited patent families surfaced by the query
Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.
HOCHEFFIZIENTE SILIZIUM-SOLARZELLE MIT HETEROÜBERG…
The present application discloses a high-efficiency silicon heterojunction (HJT) solar cell and a manufacturing method thereof, and belongs to the technical field of solar cells. In the solar cell of the present application, an N-type crystal silicon wafer is successively provided with a thin SiO2 layer, a hydrogenated amorphous carbon silicon oxide film… (excerpt from the patent abstract)
| # | Patent | Citations |
|---|---|---|
| 1 | Method of manufacturing an amorphous/crystalline s… | 97 |
| 2 | Silicon heterojunction solar cells and methods of … | 35 |
| 3 | 一种背结晶硅异质结双面太阳电池及制备方法 | 16 |
| 4 | Method of patterning an amorphous semiconductor la… | 15 |
| 5 | 一种降低单晶硅异质结太阳能电池片反射率的制绒方法 | 15 |
| 6 | 单晶硅异质结太阳电池用两面差异化绒面结构及制备方法 | 14 |
| 7 | 一种背结晶硅异质结太阳电池及其制备方法 | 11 |
| 8 | 一种单晶硅异质结太阳能电池片绒面尺寸的控制方法 | 11 |
Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.
Assignee snapshot from the current evidence set
The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.
International Business Machines Corporation
IBM holds five patent records in this corpus, all concentrated in the H01L 31 and H01L 21 semiconductor-device branches, reflecting a process-engineering focus on amorphous and crystalline silicon heterojunction structures. No recent-window momentum signal is available for IBM in the evidence, indicating its position is built on an established filing base rather than a surge of new activity.
patent records: 5Jiangxi Electric Power Investment New Energy Technology Co., Ltd.
This entity holds four patent records and shows a new-entrant momentum trend, with three records filed in the recent window. Its technology emphasis spans H01L 31 semiconductor devices and C30B crystal-growth branches, making it one of the few applicants bridging the visible semiconductor route and the sparse crystal-growth adjacent branch. Its affiliate, Electric Power Investment New Energy Technology (Longgang) Co., Ltd., contributes two additional records with the same technical focus.
patent records: 4Frequently asked questions
The corpus covers thirty patent families. This is a compact, specialist space rather than a high-volume technology area, which makes freedom-to-operate analysis more tractable but also means that individual foundational patents carry above-average weight.
International Business Machines Corporation leads with five patent records, followed by Jiangxi Electric Power Investment New Energy Technology Co., Ltd. with four. Both focus primarily on the H01L semiconductor-device branch.
The field is assessed as having reached maturity, with annual filing volume plateaued near its 2017 peak. Growth over the recent multi-year window is flat (zero percent), and no sustained upward trend is evident in the annual data.
China is the leading jurisdiction by patent-record count, reflecting both the concentration of Chinese applicants and the importance of the Chinese manufacturing market. The United States is a significant secondary jurisdiction. EPO and India each represent a smaller but present share of filings.
Two co-filing pairs are identified. The Jiangxi Electric Power Investment New Energy Technology Co., Ltd. and its affiliate Electric Power Investment New Energy Technology (Longgang) Co., Ltd. share two joint records. IMEC (Interuniversity Microelectronics Centre) and KU Leuven (Katholieke Universiteit Leuven) also share two joint records, continuing a long-established European semiconductor research alliance.
Coating and surface deposition (C23C) has only one classified record in the corpus, making it the sparsest branch. Crystal growth (C30B) and other electric solid-state devices (H10N) each have two records. These are observations of relative sparsity relative to the visible H01L branch; technical fit and organizational capability should be assessed before treating them as entry points.
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Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
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