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SHJ Lifetime / PL Quality Control Patent Snapshot 2026

SHJ Lifetime / PL Quality Control Patent Snapshot 2026
Evidence Snapshot
SHJ Lifetime / PL Quality Control Patent Snapshot in 2026

The patent corpus for SHJ lifetime and photoluminescence quality control is at a very early stage, with a single patent family on record filed by Institute of Physics Bhubaneswar in India. The field shows no established competitive concentration and represents a largely open technical space as of the current evidence window.

1
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
India
Leading jurisdiction
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Published byPatsnap Insights Team··4 min readVerified by Patsnap Eureka data
Overview

A nascent field with a single filer and no established competition

The current patent corpus for SHJ lifetime and photoluminescence quality control contains one patent family, held entirely by Institute of Physics Bhubaneswar, making it the sole ranked applicant.

With one applicant accounting for the entirety of the top hundred ranked filers’ combined total, there is no competitive tier structure to observe — the field has not yet attracted multiple institutional or commercial players.

Leading applicants
#ApplicantPatent familiesShare
1Institute of Physics Bhubaneswar1
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The sole filer’s position implies that formal IP activity in this specific intersection of silicon heterojunction characterization and PL-based quality control is only just beginning; no incumbent advantage or blocking portfolio has been established.

Only one patent family is in scope, and the most recent filing appears in 2025, so the corpus should be considered a very early snapshot subject to further publication as prosecution progresses. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

A single 2025 filing anchors the technology across three IPC branches

Annual filing activity shows no recorded filings across 2017–2024, with the sole patent family appearing in 2025. The technology composition spans three IPC branches, indicating a multi-disciplinary technical scope despite the minimal corpus size.

Annual filing trend

All recorded activity is concentrated in 2025, with zero filings in every prior year back to 2017. The 2026 data point reflects the standard publication lag and should not be interpreted as confirming zero activity for that year.

Annual filing trendAnnual values from 2017 to 2026, peaking at 1 in 2025.02017020180201902020020210202202023020241202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

The single family spans three IPC classes — C01G (compounds of other metals), C23C (coating and surface deposition), and H01L (semiconductor devices) — suggesting the invention addresses material synthesis, deposition processes, and device-level semiconductor functionality simultaneously.

Technology compositionC01G · Compounds of other metals leads with 1; C23C · Coating & surface deposition 1.C01G · Compounds of othe…1C23C · Coating & surface…1H01L · Semiconductor dev…1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
IN202531073548APublished 2025-12-26

Growth-angle controlled one-step optimization of m…

Institute Of Physics Bhubaneswar

The present disclosure provides a one-step oblique angle reactive sputtering approach enables simultaneous tuning of bulk and interfacial stoichiometry in a metal oxide/ silicon heterojunction. In case of vanadium oxides, growth angle variation controls the formation of stoichiometric SiO2, ternary SiOx(V) interlayer, and phase purity of vanadium oxide… (excerpt from the patent abstract)

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Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Institute of Physics Bhubaneswar

Institute of Physics Bhubaneswar

Institute of Physics Bhubaneswar holds 1 patent family, the entirety of the current corpus. Their technical emphasis spans C01G 31 (compounds of other metals), C23C 14 (coating and surface deposition), and H01L 31 (semiconductor devices), suggesting a device-integrated approach to SHJ characterization. No applicant momentum data is available given the single filing.

patent families: 1
Challenger · evidence pending

No challenger identified

No second applicant appears in the current corpus. The challenger position is vacant, representing a structural opening for any institution or company active in silicon heterojunction solar cell characterization, thin-film deposition, or photoluminescence metrology.

patent families: —
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Institute of Physics Bhubaneswarevidence pending+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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