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SHJ Light Management Patent Landscape 2026

SHJ Light Management Patent Landscape 2026
Competitive Landscape
SHJ Light Management Patent Landscape in 2026

The SHJ light management patent field is at a mature stage, with annual filings having plateaued near their peak; the top five filers hold roughly a third of activity among the hundred largest filers, shared across European research institutes and US technology leaders. China is the dominant filing jurisdiction, and semiconductor device engineering (H01L) accounts for the overwhelming majority of technology coverage.

55
Patent families in scope
34%
Top-5 share of top-100 filers
+25%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatSnap Insights Team··6 min readVerified by PatSnap Eureka data
Overview

A fragmented but research-institute-led field with no single dominant commercial player

The field is led jointly by IBM, EPFL, and the French Atomic Energy Commission (CEA), each filing the same number of patent records at the top of the ranking, followed closely by KU Leuven and IMEC. This multi-way tie at the front signals that no single entity has achieved decisive IP control.

The top five filers together account for roughly a third of the combined total among the hundred largest filers, indicating a moderately fragmented landscape where challengers from Chinese industry — notably Jiangxi Dianto New Energy Technology and Tongwei Solar — are actively entering.

Leading applicants
#ApplicantPatent recordsShare
1International Business Machines Corporation (IBM)6
2Ecole Polytechnique Federale de Lausanne (EPFL)6
3French Alternative Energies and Atomic Energy Commission (CEA)6
4KU Leuven (Katholieke Universiteit Leuven)5
5imec (Interuniversity Microelectronics Centre)5
63SUN S.r.l.4
7Jiangxi Dianto New Energy Technology Co., Ltd.4
8Delft University of Technology4
9Tongwei Solar (Jintang) Co., Ltd.3
10ENN Solar Energy Co., Ltd.3
#ApplicantPatent recordsShare
11Fujian Xifeng 2D Material Technology Co., Ltd.3
12The Arizona Board of Regents on behalf of the University of Arizona3
13Advanced Solar Technology Institute Xuancheng2
14Changzhou SC Exact Equipment Co., Ltd.2
15Gold Stone (Fujian) Energy Co., Ltd.2
16Jiangxi Changda High-Tech Energy Materials Technology Co., Ltd.2
17SUZHOU YUANLIAN SCI & TECH PIONEER PARK MANAGEMENT…2
18Dianto New Energy Technology (Longgang) Co., Ltd.2
19Jiujiang Dengtukuo Machinery Co., Ltd.1
20Jetion Solar (China) Co., Ltd.1
↗ Hover a row · click a company to ask Eureka

The dominance of universities and public research institutes at the top of

Filing counts for the most recent 18–24 months are subject to publication lag and will rise as pending applications publish; any apparent softness in 20232025 data should not be read as a structural decline. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly.Explore deeper in Eureka →
Trends & Structure

A 2017 peak followed by a steady rebuild, concentrated in semiconductor device engineering

The annual filing trend and the technology branch composition together show a field that originated with strong early activity, cooled, and has since rebuilt volume — while remaining technically anchored to a single dominant IPC class.

Annual filing trend

Filings peaked in 2017, fell sharply through 2019, then recovered progressively from 2020 to 2023. The 2024–2026 bars reflect publication lag rather than actual filing volume and should be treated as incomplete. The multi-year window still shows positive growth of 25%, consistent with renewed industry interest in SHJ architectures.

Annual filing trendAnnual values from 2017 to 2026, peaking at 15 in 2017.1520174201832019620207202182022122023020240202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

H01L semiconductor device engineering dominates the technology mix by a wide margin, confirming that light management innovation in SHJ is primarily pursued through device-layer and junction-engineering approaches. Crystal growth (C30B), organic semiconductors (H10K), and coating and surface deposition (C23C) each represent a small slice, marking them as structurally adjacent rather than core branches.

Technology compositionH01L · Semiconductor devices leads with 71; C30B · Crystal growth 3.H01L · Semiconductor dev…71C30B · Crystal growth3H10K · Organic semicondu…2C23C · Coating & surface…1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
EP4071830A1Published 2022-10-12

HOCHEFFIZIENTE SILIZIUM-SOLARZELLE MIT HETEROÜBERG…

Tongwei Solar (JINTANG) CO., LTD.

The present application discloses a high-efficiency silicon heterojunction (HJT) solar cell and a manufacturing method thereof, and belongs to the technical field of solar cells. In the solar cell of the present application, an N-type crystal silicon wafer is successively provided with a thin SiO2 layer, a hydrogenated amorphous carbon silicon oxide film… (excerpt from the patent abstract)

HOCHEFFIZIENTE SILIZIUM-SOLARZELLE MIT HETEROÜBERG… — patent drawingHOCHEFFIZIENTE SILIZIUM-SOLARZELLE MIT HETEROÜBERG… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Method of manufacturing an amorphous/crystalline s…97
2Silicon heterojunction solar cells and methods of …35
3一种增强型石墨烯‑硅异质结光电探测芯片及其制备方法17
4一种背结晶硅异质结双面太阳电池及制备方法16
5Method of patterning an amorphous semiconductor la…15
6一种降低单晶硅异质结太阳能电池片反射率的制绒方法15
7单晶硅异质结太阳电池用两面差异化绒面结构及制备方法14
8Deposition method of perovskite material11

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

Four structural readings — maturity stage, concentration level, collaboration patterns, and geographic coverage — shape the strategic context for any entrant or incumbent evaluating SHJ light management R&D.

Maturity

Plateau-stage field with a positive multi-year growth window

The lifecycle evidence places SHJ light management at the Maturity stage: annual filing volume has plateaued near its peak (first reached in 2017) rather than continuing to climb. The 25% growth across the recent multi-year window confirms the field is not contracting, but the era of rapid annual expansion has passed. New entrants face a body of established prior art concentrated in semiconductor device engineering.

Maturity stage
Concentration

Moderate fragmentation with a research-institute tier at the front

The top five filers — IBM, EPFL, CEA, KU Leuven, and IMEC — share roughly a third of the activity among the hundred largest filers, with no single entity holding a commanding lead. This moderate fragmentation means IP freedom-to-operate analysis is non-trivial: foundational claims are spread across multiple jurisdictions and institutional holders rather than concentrated in one portfolio.

Moderate fragmentation
Collaboration

Three active co-filing pairs anchor the collaboration network

IMEC and KU Leuven are the most active co-filers, with five jointly filed records, reflecting their long-standing joint research infrastructure. CEA and 3SUN have co-filed four records, linking a French public institute to an Italian commercial solar manufacturer. Jiangxi Dianto New Energy Technology and its affiliate Dianto New Energy Technology (Longgang) have jointly filed two records, signaling an emerging Chinese industry cluster built around shared IP.

Institute–industry pairs
Geography

China leads in filing volume; US and Europe hold quality anchor positions

China is the lead filing jurisdiction with the largest share of patent records, followed by the United States and Europe (EPO). India and WIPO (PCT) filings round out the international picture. This distribution suggests Chinese manufacturers are actively building domestic protection, while US and European research institutes are securing broader international coverage through EPO and PCT routes.

China-led, globally spread
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Top collaboration links
ApplicantCollaboratorCo-filings
imec (Interuniversity Microelectronics Centre)KU Leuven (Katholieke Universiteit Leuven)5
French Alternative Energies and Atomic Energy Commission (CEA)3SUN S.r.l.4
Jiangxi Dianto New Energy Technology Co., Ltd.Dianto New Energy Technology (Longgang) Co., Ltd.2

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Insights are derived from applicant ranking, lifecycle, collaboration, and jurisdiction evidence for the SHJ light management corpus.Explore insights →
Leaders

IBM and EPFL co-lead on semiconductor device claims; CEA spans the broadest technology range

The leading positions are held by institutions with complementary emphases: IBM and EPFL concentrate on core H01L semiconductor device engineering, while CEA extends across multiple H01L sub-classes and into organic semiconductors.

Leader · IBM

International Business Machines Corporation

IBM holds 6 patent records at the top of the ranking, focused entirely on H01L semiconductor device engineering across two sub-classes (H01L31 and H01L21), indicating a device-process emphasis on junction fabrication and semiconductor manufacturing. Momentum data for IBM is not available in the current evidence set; its established corpus positions it as the reference holder for foundational process claims.

patent records: 6
Challenger · CEA

French Alternative Energies and Atomic Energy Commission (CEA)

CEA also holds 6 patent records but spans a broader technology range, covering H01L31, H01L27, and H01L51 — the last indicating organic and thin-film device work alongside crystalline silicon heterojunction claims. CEA’s active co-filing relationship with 3SUN (4 joint records) further links its research pipeline to commercial manufacturing, and its momentum trend is marked as a new entrant in the recent filing window, suggesting fresh activity from a small recent base.

patent records: 6
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ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)INTERUNIVERSITAIR MICRO ELECTRONICS CENT (IMEC VZW)+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
French Alternative Energies and Atomic Energy Commission (CEA)1▲ new entrant
Delft University of Technology4▲ new entrant
3SUN S.r.l.1▲ new entrant
Jiangxi Dianto New Energy Technology Co., Ltd.3▲ new entrant
Source: PatSnap Eureka. Player profiles draw on applicant ranking, technology focus, and filing momentum evidence for the SHJ light management corpus.Explore players →
Adjacent Branches

Three under-served IPC branches adjacent to the dominant H01L core

Three IPC branches account for a small fraction of SHJ light management patent records collectively; each is structurally adjacent to the dominant semiconductor device class and carries plausible technical relevance to light management performance.

C30B · Crystal growth

Crystal growth methods appear in only 3 patent records, representing roughly 4% of the technology composition. Controlling silicon crystal morphology at the heterojunction interface directly governs carrier lifetime and optical absorption — core light management parameters. The sparse coverage suggests that crystal-growth-specific claims have not been systematically pursued alongside device-layer filings. An entrant with expertise in epitaxial or monocrystalline silicon growth could find room to build differentiated positions here, though the small prior-art base may reflect inherent technical difficulty rather than pure neglect.

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C23C · Coating and surface deposition

Surface deposition appears in only 1 patent record, the sparsest branch in the corpus. Anti-reflection and passivation coatings deposited by CVD, ALD, or sputtering are directly relevant to front-surface light management in SHJ cells. The near-absence of C23C filings is notable given that deposition process innovation is central to industrial SHJ manufacturing scale-up. This is an observation of relative sparsity; a realistic entry path exists for equipment or materials suppliers already active in thin-film deposition who can connect their process IP to SHJ-specific light management outcomes.

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See all adjacent IPC branches ranked by filing density and technical proximity to SHJ light management.
H10K · Organic semiconductors applied to SHJ light managementC30B · Crystal growth for heterojunction interface control+ more
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Source: PatSnap Eureka. Adjacent branch observations are derived from the IPC composition of the SHJ light management patent corpus; low count alone does not confirm commercial opportunity.Explore emerging →
Route Matrix

How leading applicants differ across technology sub-classes

Route coverage across the main technology branches in the current evidence set.

PlayerH01L 31 · Semiconductor devicesH01L 21 · Semiconductor devicesH01L 51 · Semiconductor devicesC30B 33 · Crystal growthH01L 27 · Semiconductor devices
French Alternative Energies and Atomic Energy Commission (CEA)Strong · 6AbsentModerate · 3AbsentModerate · 3
3SUN S.r.l.Strong · 4AbsentStrong · 3AbsentStrong · 3
International Business Machines Corporation (IBM)Strong · 6Moderate · 3AbsentAbsentAbsent
Ecole Polytechnique Federale de Lausanne (EPFL)Strong · 6AbsentAbsentAbsentAbsent
KU Leuven (Katholieke Universiteit Leuven)Strong · 5Emerging · 1AbsentAbsentAbsent
imec (Interuniversity Microelectronics Centre)Strong · 5Emerging · 1AbsentAbsentAbsent
Delft University of TechnologyStrong · 4AbsentAbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

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