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SiC Monolithic Compact Integration Patent Snapshot 2026

SiC Monolithic Compact Integration Patent Snapshot 2026
Evidence Snapshot
SiC Monolithic / Compact Integration Patent Snapshot in 2026

II-VI Advanced Materials holds a commanding lead in SiC monolithic and compact integration patents, with the United States as the dominant filing jurisdiction. The field is still expanding on a multi-year basis, though annual volume has eased from its 2020 peak and remains subject to publication lag in the most recent years.

19
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
United States
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

II-VI Advanced Materials leads a concentrated, early-stage field

II-VI Advanced Materials LLC sits atop the applicant ranking with 7 patent records, roughly three times the nearest challengers. Panasonic Holdings follows with 4 patent records, while ETH Zurich, General Electric, Ben Gurion University of the Negev, and Paul Scherrer Institut each hold 2 patent records.

The top five filers account for 57% of the combined total among the ranked applicants visible in this query, indicating a notably concentrated visible assignee structure for a field of this size. The gap between the leader and the second tier is significant, though the presence of research institutes and universities among the top ranked applicants signals that foundational IP is still being established.

Leading applicants
#ApplicantPatent recordsShare
1II-VI Advanced Materials LLC7
2Panasonic Holdings Corp4
3ETH Zurich (ETH Transfer)2
4General Electric Co2
5Ben Gurion University of the Negev2
6Paul Scherrer Institut2
7Zhuzhou CRRC Times Semiconductor Co., Ltd.1
8Taiyuan Yongming Hengyongyuan Electronics Co., Ltd.1
9Xi’an Yingran Semiconductor Technology Co., Ltd.1
#ApplicantPatent recordsShare
10Amir Ben-Tal (individual inventor)1
11Amit Ben-Kish (individual inventor)1
12NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP …1
13Baixun Information Technology Co., Ltd.1
14Osaka City University (Public University Corporation)1
15Matthew H. Kim (individual inventor)1
16Air Water Inc.1
17HRL Laboratories LLC1
↗ Hover a row · click a company to ask Eureka

II-VI Advanced Materials’ position, reinforced by momentum data showing it as a new entrant with a sharply rising trajectory, suggests that a single industrial player has moved quickly to are visible in what remains a largely open evidence snapshot. The diversity of academic co-filers indicates that much of the fundamental science remains in translation from research to commercial application.

Filing counts for the most recent 18 to 24 months are likely understated due to standard patent publication lag and should not be interpreted as a slowdown in activity. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Multi-year growth with a technology mix anchored in core semiconductor device classes

The annual filing trend and technology composition together reveal a field that is expanding on a multi-year basis while remaining heavily concentrated in foundational semiconductor device classifications, with power conversion and packaging branches attracting only sparse coverage.

Annual filing trend

Filings were negligible in 2017, picked up from 2018, and reached a local peak in 2020 with 4 patent records. Activity continued in subsequent years but annual volume has eased from that 2020 peak. The most recent years (2024–2026) show reduced counts that are partly attributable to publication lag and should not be read as a sustained decline.

Annual filing trendAnnual values from 2017 to 2026, peaking at 4 in 2020.02017320181201942020020214202222023320242202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

The visible branch is H01L (Semiconductor devices) with 28 patent records, followed by H10P with 8 and H10D (Semiconductor devices, general) with 7. Power conversion (H02M) and printed circuits and assemblies (H05K) account for only 2 and 1 patent records respectively, marking them as sparsely covered adjacent branches relative to the core device classes.

Technology compositionH01L · Semiconductor devices leads with 28; H10P 8.H01L · Semiconductor dev…28H10P8H10D · Semiconductor dev…7H10W4H02M · Power conversion …2H05K · Printed circuits …1↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20220399442A1Published 2022-12-15

Methods of manufacturing semiconductor devices

Eth Zuerich

A method forms a part of a power semiconductor device. The method includes homoepitaxially forming two silicon carbide layers on a first side of a silicon carbide substrate and forming a pattern of pits on a second side of the silicon carbide substrate. The two layers include a buffer layer, on the first side of the silicon carbide substrate, and have a… (excerpt from the patent abstract)

Methods of manufacturing semiconductor devices — patent drawingMethods of manufacturing semiconductor devices — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1Semiconductor device and its manufacturing method59
2Semiconductor device with a plurality of semicondu…30
3Novel material and process for integrated ion chip23
4Thermal management for heterogeneously integrated …18
5A concept for silicon carbide power devices8
6Novel material and process for integrated ion chip8
7Methods of manufacturing semiconductor devices7
8Semiconductor device and its manufacturing method7

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · II-VI Advanced Materials LLC

II-VI Advanced Materials LLC

II-VI Advanced Materials LLC holds 7 patent records, the largest position in this corpus, and is flagged as a new entrant with a sharply rising trajectory — indicating that its dominance has been established rapidly rather than accumulated over a long period. Its technology emphasis spans H01L 21, H01L 27, and H01L 29, covering semiconductor device fabrication, integrated circuit structures, and discrete semiconductor devices — the full core of SiC monolithic integration.

patent records: 7
Challenger · Panasonic Holdings Corp

Panasonic Holdings Corp

Panasonic Holdings Corp holds 4 patent records and focuses its coverage on H01L 23 (semiconductor device packaging and thermal management), H01L 25 (assemblies of semiconductor devices), and H10D 30 (general semiconductor device structures). This package-and-assembly emphasis is complementary to, rather than directly overlapping with, II-VI Advanced Materials’ fabrication-centric portfolio, suggesting Panasonic is addressing the integration and thermal management layer of the SiC compact integration stack.

patent records: 4
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
ETH Zurich (ETH Transfer)General Electric Co+ more
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Source: Patsnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
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Frequently asked questions

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Built on Patsnap Open Platform

This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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