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SiC Power AI/ML Patent Landscape 2026

SiC Power AI/ML Patent Landscape 2026
Competitive Landscape
SiC Power AI/ML Patent Landscape in 2026

The application of AI and machine learning to SiC power semiconductor design, crystal growth, and device characterisation is an early-stage but rapidly expanding field, with annual filings still rising and the patent corpus still small enough for a well-targeted programme to establish a credible position. China accounts for the large majority of disclosures and the applicant base is highly fragmented, with no single organisation holding a dominant share.

68
Patent families in scope
12%
Top-5 share of top-100 filers
+81%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatsnap Insights Team··6 min readVerified by Patsnap Eureka data
Overview

A fragmented, China-centric field with no dominant assignee

The corpus spans 68 patent families. The leading applicant, Rohankar Ketaki Nilesh, holds only 2 patent records, a position shared by eleven other filers, making this one of the most evenly distributed early-stage technology landscapes observable at this scale.

The top five filers account for just 12% of the combined output of the hundred largest filers, confirming that no player has yet established a controlling portfolio. The field sits in a first-mover window where concentration is low and entrenchment is minimal.

Leading applicants
#ApplicantPatent recordsShare
1ROHANKAR KETAKI NILESH2
2CHINA UNIV OF MINING & TECH2
3PLA Strategic Support Force Information Engineering University2
4NANJING UNIV OF AERONAUTICS & ASTRONAUTICS2
5Vishay Siliconix LLC2
6ROHANKAR RUGVED N2
7Ewision Semiconductor Technology (Shanghai) Co Ltd2
8Anhui University2
9ROHANKAR NILESH B2
10Wolfspeed Inc2
#ApplicantPatent recordsShare
11Beihang University2
12SICC Co Ltd2
13Tianjin Polytechnic University1
14Chongqing University of Science and Technology1
15DR PUTTAMADAPPA C1
16Wuhan University1
17Suzhou University1
18DR RANJITHA S1
19Shenzhen Jinyu Semiconductor Co Ltd1
20CHONGQING UNIV OF POSTS & TELECOMM1
↗ Hover a row · click a company to ask Eureka

The even distribution across academic institutions, semiconductor companies, and independent inventors signals that this technology is being explored in parallel by many actors rather than being driven by a single incumbent roadmap. That creates both freedom to operate and competitive uncertainty.

Filings from 2025 and 2026 are under-counted because of the standard patent-publication lag; the apparent plateau in those years should not be read as a slowdown. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: Patsnap Eureka. Chart shows the top applicants ranked by patent records; the corpus total is measured in patent families. These figures use different units and should not be compared directly. This same dataset is now available on Patsnap Open Platform via MCP.Connect via MCP →
Trends & Structure

Strong recent acceleration dominated by AI-model and data-processing classifications

Annual filing activity and the technology class mix together reveal a field that began gaining serious traction around 2020 and accelerated sharply in 2024–2025, with AI-model computing forming the clear technical core.

Annual filing trend

Filings were negligible before 2020, reached an initial plateau of seven records per year in 2020–2021, dipped to four to five in 2022–2023, then surged to twenty records in 2024 and nineteen in 2025. The 81% recent-window growth rate reflects a genuine acceleration. The 2025–2026 bars are suppressed by publication lag and will grow as disclosures publish.

Annual filing trendAnnual values from 2017 to 2026, peaking at 20 in 2024.0201712018220197202072021520224202320202419202532026↗ Hover for values · click a bar to ask Eureka

Technology composition

G06N (computing based on AI models) accounts for the plurality of records, confirming that neural-network and machine-learning methods are the dominant technical route. G06F (electric digital data processing) and H01L (semiconductor devices) follow, while power-conversion (H02M) and crystal-growth (C30B) classes reflect the underlying SiC application domains. The breadth of IPC classes — spanning measurement, image recognition, computational chemistry, and even additive manufacturing — points to wide exploratory activity rather than a focused application niche.

Technology compositionG06N · Computing based on AI models leads with 58; G06F · Electric digital data processing 32.G06N · Computing based o…58G06F · Electric digital …32H01L · Semiconductor dev…10G06T · Image data proces…9G06V · Image/video recog…7G16C · Computational che…7H02M · Power conversion …7C30B · Crystal growth5↗ Hover for values · click a bar to ask Eureka
Source: Patsnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20210230769A1Published 2021-07-29

Dislocation distribution for silicon carbide cryst…

WOLFSPEED, INC.

Silicon carbide (SiC) wafers, SiC boules, and related methods are disclosed that provide improved dislocation distributions. SiC boules are provided that demonstrate reduced dislocation densities and improved dislocation uniformity across longer boule lengths. Corresponding SiC wafers include reduced total dislocation density (TDD) values and improved TDD… (excerpt from the patent abstract)

Dislocation distribution for silicon carbide cryst… — patent drawingDislocation distribution for silicon carbide cryst… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1一种预测SiC单晶炉内整体温度场的方法及设备50
2一种基于神经网络的碳化硅MOS器件结温在线测量方法12
3一种基于神经网络的碳化硅场效应管模型11
4Dislocation distribution for silicon carbide cryst…10
5一种电致发光半导体板材表面缺陷AI检测方法9
6Dislocation distribution for silicon carbide cryst…8
7离子注入碳化硅半导体掺杂过程的模拟仿真方法与装置7
8一种基于碳化硅的智能功率模块及应用7

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: Patsnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

China-heavy jurisdiction profile shapes a specific set of opportunities and risks for non-Chinese entrants and academic collaborators alike.

Growth

Early Growth — annual filings still rising

The lifecycle assessment places this field firmly in the Growth stage, with annual filings still rising and an 81% increase in the recent measurement window. The corpus of 68 patent families is small enough that a focused filing programme initiated now could reach the top tier within two to three years. The absence of a dominant incumbency position means freedom-to-operate risk is currently lower than in adjacent mature SiC-device classes.

Growth stage
Concentration

Extremely fragmented — top five hold 12% of the top-100 share

The top five filers collectively account for only 12% of the combined output of the hundred largest filers, and the leading applicant holds just 2 patent records. This degree of fragmentation is unusual even for an emerging field and suggests that no player has yet committed the resources necessary to build a defensive portfolio. A sustained filing programme over 24–36 months could realistically capture a material share of the active landscape.

Low concentration
Collaboration

One confirmed co-filing pair: Nanjing University of Aeronautics & Astronautics with Suzhou Nuclear Power Research Institute

The evidence shows a single documented co-application between Nanjing University of Aeronautics & Astronautics and Suzhou Nuclear Power Research Institute (Suzhou Thermal Engineering Research Institute). This pairing of an aerospace-oriented university with a nuclear-power-sector research organisation points to reliability and condition-monitoring applications of SiC AI/ML as one collaboration axis. The scarcity of co-filings overall suggests that university–industry collaboration in this space is nascent and underexploited.

Nascent collaboration
Geography

China accounts for the large majority of filings; US and India are present but minor

China is the lead filing jurisdiction by a substantial margin, followed at a great distance by India, with Israel, the Netherlands, the United States, Germany, South Korea, and Taiwan each contributing a small number of records. This skew means that IP protection strategies outside China are largely unchallenged today, and a parallel filing programme targeting US, European, or Japanese offices would face minimal prior-art density from existing portfolio holders.

China-dominant
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Top collaboration links
ApplicantCollaboratorCo-filings
Nanjing University of Aeronautics and AstronauticsSuzhou Nuclear Power Research Institute Co Ltd1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: Patsnap Eureka. Jurisdiction counts are at the patent-record level; a family may be filed in multiple jurisdictions.Explore insights →
Leaders

New entrants dominate the leaderboard; device specialists and AI-focused labs lead by route

Every ranked applicant with tracked momentum is classified as a new entrant, reflecting how recently this application domain crystallised. Technical emphasis divides broadly into AI-model methods applied to device physics versus power-conversion circuit optimisation.

Leader · Wolfspeed Inc

Wolfspeed Inc

Wolfspeed holds 2 patent records in the corpus, focused on crystal-growth methods (C30B) and semiconductor devices (H01L), reflecting its position as the leading merchant SiC substrate and device supplier applying machine-learning methods to crystal-quality and defect characterisation. Its momentum is that of a new entrant in this specific AI/ML application sub-field, consistent with the overall nascency of the corpus.

patent records: 2
Challenger · Ewision Semiconductor (Shanghai)

Ewision Semiconductor Technology (Shanghai)

Ewision Semiconductor Technology (Shanghai), listed in the evidence as, holds 2 patent records with technical emphasis on digital data processing (G06F) and AI-model computing (G06N), complemented by electrical measurement (G01R). Its entry as a new entrant suggests recent strategic commitment to integrating machine-learning diagnostics with SiC device characterisation workflows.

patent records: 2
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SICC Co LtdBeihang University+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Vishay Siliconix LLC2▲ new entrant
Anhui University1▲ new entrant
Nanjing University of Aeronautics and Astronautics2▲ new entrant
China University of Mining and Technology2▲ new entrant
PLA Strategic Support Force Information Engineering University2▲ new entrant
MR RUGVED N ROHANKAR2▲ new entrant
Source: Patsnap Eureka. Applicant rankings are based on patent records; all momentum-tracked filers entered the corpus as new entrants.Explore players →
Adjacent Branches

Under-served IPC branches adjacent to the AI/ML-SiC core

Several IPC classes within the corpus carry low record counts relative to the dominant G06N cluster, representing areas where AI/ML methods touch SiC power technology but have received limited dedicated patent attention to date.

H02M · Power conversion (AC/DC etc.)

H02M covers the inverter, converter, and gate-driver circuits where SiC devices deliver their primary performance advantage. With only 7 patent records in this branch and a 4% share of the top-100 filers’ output, AI/ML methods for real-time converter control, loss optimisation, and predictive gate-drive tuning are sparsely covered. The technical value is high — converter efficiency and reliability are commercial differentiators — and an entry path exists through combining existing SiC circuit expertise with neural-network control literature. This is an under-served adjacent branch with plausible technical value.

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G16C · Computational chemistry / materials informatics

G16C (computational chemistry) holds 7 patent records in the corpus, covering AI-assisted simulation of SiC crystal defects, doping profiles, and epitaxial process parameters. Given the critical role of material defect density in SiC device yield, this branch sits at the intersection of process engineering and AI-driven materials informatics — an area where pharmaceutical and materials-science AI methods are increasingly being transferred. The branch is sparse (4% share of top-100 output) but technically adjacent to the most-cited patent cluster, which centres on neural-network prediction of SiC furnace temperature fields. Research groups with computational chemistry capability have a realistic entry path.

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G06V · Image/video recognition for SiC defect inspectionC30B · Crystal growth process AI optimisation+ more
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Source: Patsnap Eureka. White-space branches are identified as IPC classes with low record counts relative to the corpus dominant class; they are observations of relative sparsity, not validated market opportunities.Explore emerging →
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This report’s underlying patent dataset — filings, assignees, technology clusters — is open for developers via MCP and REST API. Free to start, 10,000 credits, no credit card required.

Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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