Silicon Carbide MOSFET Safety and Compliance Patents: Top Companies & Trends 2026
- Filing has gone flat since its 2017 peak. activity ran from 15 filings that year down to just 2 by the 2022 midpoint, with the latest tracked year at zero.
- Protection is claimed almost entirely at the device level. 42 of 46 records sit in H01L, leaving circuit-level protection (H02H) and H10P as thin, under-claimed branches.
- No assignee shows current filing momentum. every major holder tracked — Bosch, GE, Infineon, Hitachi Energy, Nexperia — reports zero filings in the most recent year.
What this patent landscape covers
This dataset tracks patent families matching silicon carbide MOSFET device claims combined with short-circuit ruggedness, AEC-Q101 qualification or avalanche ruggedness language, covering publications from 2015 through mid-2026. It captures 46 patent families in total, concentrated heavily in semiconductor-device structure claims rather than external protection circuitry.
Filing activity peaked in 2017 and has since declined toward a flat baseline, with the most recent tracked year showing no new filings from any of the assignees in the momentum data. Because publication typically lags filing by around 18 months, the last one to two years understate true activity, but the broader multi-year decline from the 2017 peak is a real pattern rather than an artifact of lag alone.
Filing trends and technology composition
Filing activity in silicon carbide MOSFET safety and compliance peaked years ago and has since gone flat, while the underlying technology composition stays tightly concentrated in a small set of IPC subclasses.
Filings peaked in 2017 and have not recovered
Filings ran from 15 in 2017 down to a 2022 midpoint of just 2, with the most recent year showing zero — a pattern consistent with either genuine cooling of new filing or the normal 18-month publication lag understating the last one to two years.
Six IPC subclasses, one dominant
H01L (semiconductor devices) covers 42 of 46 records and H10D adds 19, meaning most protection is claimed at the device-structure level; H03K, H02H and H10P together account for a small fraction, marking the circuit-level and packaging-adjacent space as comparatively open.
Shares are the percentage of the 46 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.
Go deeper on Silicon Carbide MOSFET Safety and Compliance with Eureka
This page is one run against one query. Ask Eureka your own question about silicon carbide mosfet safety and compliance and every answer comes back with the patent numbers behind it.
Try EurekaRepresentative and most-cited filings
Vertical SiC MOSFET (US20200295186A1)
A vertical SiC MOSFET having a source terminal, a drain terminal, and a gate region, with an epitaxial layer between source and drain carrying a horizontally extending intermediate layer of opposite doping type that is electrically connected to the source terminal; the gate region sits in a gate trench.Filed by Robert Bosch GmbH, published 2020-09-17. The source-connected buried layer is positioned to shield the gate oxide during avalanche or short-circuit stress.
| # | Publication no. | Patent title | Citations |
|---|---|---|---|
| 1 | US20170040312A1 | Avalanche-Rugged Quasi-Vertical HEMT | 39 |
| 2 | US20200259012A1 | Vertical transistor structure with buried channel and resurf regions and method of manufacturing the same | 27 |
| 3 | US20170345917A1 | Electric assembly including a bipolar switching device and a wide bandgap transistor | 22 |
| 4 | US20180337273A1 | Semiconductor device layout and method for forming same | 11 |
| 5 | US20200295186A1 | Vertical sic mosfet | 10 |
| 6 | US9570438B1 | Avalanche-rugged quasi-vertical HEMT | 9 |
| 7 | US20180269872A1 | Transistor device | 8 |
| 8 | US20220093784A1 | Vertical transistor structure with buried channel and resurf regions and method of manufacturing the same | 6 |
| 9 | US10475909B2 | Electric assembly including a bipolar switching device and a wide bandgap transistor | 6 |
| 10 | US20180269871A1 | Transistor device | 5 |
Ranked by citation count within the searched corpus; older filings are structurally favored, so treat ranking as a measure of influence rather than current commercial weight.
Each row carries its publication number; clicking a row searches Eureka by that number.
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Reading the citation and IPC data together points to a field where the foundational device architectures were claimed early and heavily, and where recent activity has cooled across every tracked holder.
One vertical structure anchors the field
US20170040312A1 carries far more citations than any other record in this corpus, and the next two most-cited filings also center on vertical device structures or hybrid switching assemblies. That concentration means later filings, including Bosch's 2020 vertical MOSFET, are building directly on a small set of foundational claims rather than opening new ground.
Protection circuits are the thin branch
Semiconductor-device claims (H01L) outnumber protective-circuit-arrangement claims (H02H) by more than twenty to one in this dataset. That split suggests most patented ruggedness comes from how the device itself is built, not from external circuitry that detects and responds to a fault.
Momentum has not returned to 2017 levels
The 2017 peak of 15 filings has not been matched since; the 2022 midpoint sits at just 2. Recent-year momentum data shows every tracked assignee at zero for the latest year, reinforcing that this is a mature, low-activity corner of SiC power device patenting rather than an emerging one.
Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to silicon carbide mosfet safety and compliance, with the prior art for and against each one.
Who holds the claims, and where the room is
The recent-year momentum table lists six organizations tracked for current activity, and all six show zero filings in the latest year — a flat picture across Bosch, GE, Infineon's German and Austrian entities, Hitachi Energy Switzerland and Nexperia. The more revealing signal sits in the citation table, where a small number of vertical-structure and hybrid-assembly filings carry outsized influence over later claims.
Vertical structure sets the reference point
The most-cited record in this corpus, an avalanche-rugged quasi-vertical HEMT design, anchors the device-architecture route that later vertical SiC MOSFET filings, including Bosch's buried-layer design, build directly on.
A second, application-specific route
A separate filing claims an electric assembly combining a bipolar switching device with a wide-bandgap transistor, offering an alternative to pure device-structure claims for systems that already use a qualified bipolar switch.
No current filer is pulling ahead
Robert Bosch, General Electric, Infineon (Germany and Austria), Hitachi Energy Switzerland and Nexperia all report zero filings in the most recent tracked year, meaning the competitive picture here has gone static rather than being actively reshaped.
| Assignee | Recent year | YoY |
|---|---|---|
| Robert Bosch GmbH (Germany) | 0 | — |
| General Electric Company | 0 | — |
| Infineon Technologies AG | 0 | — |
| Infineon Technologies Austria AG | 0 | — |
| Hitachi Energy Switzerland AG | 0 | — |
| Nexperia B.V. | 0 | — |
| DYNEX SEMICON LIMITED & ZHUZHOU CSR TIMESELECTRIC | 0 | — |
| Monolithic Power Systems (Taiwan) Co., Ltd. | 0 | — |
Where to take this next
The filing pattern here is settled rather than active, which changes what due diligence should focus on: less on tracking a fast-moving competitor, more on mapping exactly which claim elements the foundational filings cover.
Run a full claim chart on the top-cited filings
The three most-cited records in this corpus carry disproportionate influence over later vertical-structure and hybrid-assembly designs. A claim-element breakdown of each clarifies exactly what freedom to operate looks like before committing to a device architecture.
Build a claim chart in EurekaCheck the protective-circuit branch before filing
H02H and H10P are thin relative to the dominant device-structure classes, suggesting genuine white space in gate-driver and fault-response circuit claims rather than further device-structure variants.
Explore white space in EurekaFrequently asked questions
Short-circuit ruggedness describes a MOSFET's ability to survive a short-circuit fault condition for a defined time window without thermal or electrical failure, which matters because automotive and industrial power designs are qualified against exactly this failure mode. Patent filings in this space typically claim either a device structure that limits current or heat buildup during the fault, or a protection circuit that detects the fault and shuts the device down before damage occurs. Compliance testing standards reference ruggedness thresholds directly, so a device's patented protection mechanism often becomes part of its qualification story.
AEC-Q101 is an automotive-industry qualification standard for discrete semiconductor components, and it is referenced in this dataset's search criteria alongside short-circuit and avalanche ruggedness because these are the failure modes the standard's stress tests target. Patents that claim specific avalanche-ruggedness or short-circuit-protection structures are effectively building toward passing that qualification, even though the standard itself is not something a patent claims. Reviewing which structural or circuit approaches appear most in the patent record gives a sense of which design strategies vendors are relying on to pass AEC-Q101 testing.
The evidence shows filings peaking at 15 in 2017 and dropping to a midpoint of 2 by 2022, with the most recent tracked year at zero. This does not necessarily mean the underlying problem is solved; it more likely reflects that the foundational structural approaches — buried layers, trench gates, RESURF regions — were claimed early and heavily, leaving less room for entirely new structural claims. It is also important to remember that publication lags filing by roughly 18 months, so the very last year or two in any filing trend will always look thinner than it eventually turns out to be.
The dataset's recent-year momentum table lists organizations including Robert Bosch, General Electric, Infineon Technologies (both its German and Austrian entities), Hitachi Energy Switzerland, and Nexperia, though every one of them shows zero filings in the most recent tracked year. That flat recent activity across all major holders suggests the competitive picture in this niche is currently static rather than being reshaped by any single fast-moving filer. The most heavily cited individual records, rather than any one assignee's overall volume, are the better guide to which technical approaches carry the most influence.
The IPC composition shows a heavy concentration in H01L and H10D, the core semiconductor-device classes, while H02H (protective circuit arrangements) and H10P each carry only one or two records. That gap suggests circuit-level protection schemes — gate-driver responses to short-circuit conditions, for instance — are comparatively under-claimed relative to the device-structure approaches that dominate the corpus. A team looking for open claim space would do better looking at the protection-circuit side of the problem than at further variations on the buried-layer vertical MOSFET structure.
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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.
Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.
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Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.