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Silicon Carbide MOSFET Safety and Compliance Patents: Top Companies & Trends 2026

Silicon Carbide MOSFET Safety and Compliance Patents: Top Companies & Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/silicon-carbide-mosfet-safety-and-compliance-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Semiconductors & Microelectronics · Patent Landscape
Silicon Carbide MOSFET Safety and Compliance Patents
  • Filing has gone flat since its 2017 peak. activity ran from 15 filings that year down to just 2 by the 2022 midpoint, with the latest tracked year at zero.
  • Protection is claimed almost entirely at the device level. 42 of 46 records sit in H01L, leaving circuit-level protection (H02H) and H10P as thin, under-claimed branches.
  • No assignee shows current filing momentum. every major holder tracked — Bosch, GE, Infineon, Hitachi Energy, Nexperia — reports zero filings in the most recent year.
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46
Published Records
61%
Top-5 Share of All Records
0%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What this patent landscape covers

This dataset tracks patent families matching silicon carbide MOSFET device claims combined with short-circuit ruggedness, AEC-Q101 qualification or avalanche ruggedness language, covering publications from 2015 through mid-2026. It captures 46 patent families in total, concentrated heavily in semiconductor-device structure claims rather than external protection circuitry.

Filing activity peaked in 2017 and has since declined toward a flat baseline, with the most recent tracked year showing no new filings from any of the assignees in the momentum data. Because publication typically lags filing by around 18 months, the last one to two years understate true activity, but the broader multi-year decline from the 2017 peak is a real pattern rather than an artifact of lag alone.

Filing volume and IPC composition, 2017–2026
  1. 1ROBERT BOSCH GMBH12
  2. 2GENERAL ELECTRIC CO4
  3. 3INFINEON TECH AUSTRIA AG4
  4. 4MONOLITHIC POWER SYSTEMS INC4
  5. 5INFINEON TECHNOLOGIES AG4
  6. 6NEXPERIA BV3
  7. 7ZHUZHOU CSR TIMES ELECTRIC CO LTD3
  8. 8NORTH CAROLINA STATE UNIV2
  9. 9SANGDEST MICROELECTRONICS (NANJING) CO LTD2
  10. 10FUJI ELECTRIC CO LTD2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Filing Data

Filing trends and technology composition

Filing activity in silicon carbide MOSFET safety and compliance peaked years ago and has since gone flat, while the underlying technology composition stays tightly concentrated in a small set of IPC subclasses.

Filings peaked in 2017 and have not recovered

Filings ran from 15 in 2017 down to a 2022 midpoint of just 2, with the most recent year showing zero — a pattern consistent with either genuine cooling of new filing or the normal 18-month publication lag understating the last one to two years.

Filings peaked in 2017 and have not recovered04811151520172018201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Six IPC subclasses, one dominant

H01L (semiconductor devices) covers 42 of 46 records and H10D adds 19, meaning most protection is claimed at the device-structure level; H03K, H02H and H10P together account for a small fraction, marking the circuit-level and packaging-adjacent space as comparatively open.

Six IPC subclasses, one dominantH01L · Semiconductor devices4291.3%H10D · Semiconductor devices (general)1941.3%H03K · Pulse technique & logic circui…817.4%H10W48.7%H02H · Protective circuit arrangements24.3%H10P12.2%

Shares are the percentage of the 46 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

Representative and most-cited filings

Representative filing
US20200295186A12020-09-17

Vertical SiC MOSFET (US20200295186A1)

ROBERT BOSCH GMBH

A vertical SiC MOSFET having a source terminal, a drain terminal, and a gate region, with an epitaxial layer between source and drain carrying a horizontally extending intermediate layer of opposite doping type that is electrically connected to the source terminal; the gate region sits in a gate trench.Filed by Robert Bosch GmbH, published 2020-09-17. The source-connected buried layer is positioned to shield the gate oxide during avalanche or short-circuit stress.

US20200295186A1 — patent drawing 1US20200295186A1 — patent drawing 2
View full filing
Most-cited records in this corpus
#Publication no.Patent titleCitations
1US20170040312A1Avalanche-Rugged Quasi-Vertical HEMT39
2US20200259012A1Vertical transistor structure with buried channel and resurf regions and method of manufacturing the same27
3US20170345917A1Electric assembly including a bipolar switching device and a wide bandgap transistor22
4US20180337273A1Semiconductor device layout and method for forming same11
5US20200295186A1Vertical sic mosfet10
6US9570438B1Avalanche-rugged quasi-vertical HEMT9
7US20180269872A1Transistor device8
8US20220093784A1Vertical transistor structure with buried channel and resurf regions and method of manufacturing the same6
9US10475909B2Electric assembly including a bipolar switching device and a wide bandgap transistor6
10US20180269871A1Transistor device5

Ranked by citation count within the searched corpus; older filings are structurally favored, so treat ranking as a measure of influence rather than current commercial weight.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Signals

What the filing pattern signals

Reading the citation and IPC data together points to a field where the foundational device architectures were claimed early and heavily, and where recent activity has cooled across every tracked holder.

Citation concentration
39 citations
top-cited record

One vertical structure anchors the field

US20170040312A1 carries far more citations than any other record in this corpus, and the next two most-cited filings also center on vertical device structures or hybrid switching assemblies. That concentration means later filings, including Bosch's 2020 vertical MOSFET, are building directly on a small set of foundational claims rather than opening new ground.

Citation counts favor older records inside a searched corpus — treat this as a signal of influence, not current relevance.
Device vs. circuit split
42 vs 2 records
H01L vs H02H

Protection circuits are the thin branch

Semiconductor-device claims (H01L) outnumber protective-circuit-arrangement claims (H02H) by more than twenty to one in this dataset. That split suggests most patented ruggedness comes from how the device itself is built, not from external circuitry that detects and responds to a fault.

A 20:1 split like this typically means the circuit side is either genuinely unclaimed or still being filed under different search terms.
Filing trajectory
15 → 0
2017 peak to latest year

Momentum has not returned to 2017 levels

The 2017 peak of 15 filings has not been matched since; the 2022 midpoint sits at just 2. Recent-year momentum data shows every tracked assignee at zero for the latest year, reinforcing that this is a mature, low-activity corner of SiC power device patenting rather than an emerging one.

Publication lag of roughly 18 months means the last one to two years will always understate true filing activity.
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to silicon carbide mosfet safety and compliance, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the claims, and where the room is

The recent-year momentum table lists six organizations tracked for current activity, and all six show zero filings in the latest year — a flat picture across Bosch, GE, Infineon's German and Austrian entities, Hitachi Energy Switzerland and Nexperia. The more revealing signal sits in the citation table, where a small number of vertical-structure and hybrid-assembly filings carry outsized influence over later claims.

Device architecture
39 citations
top-cited filing

Vertical structure sets the reference point

The most-cited record in this corpus, an avalanche-rugged quasi-vertical HEMT design, anchors the device-architecture route that later vertical SiC MOSFET filings, including Bosch's buried-layer design, build directly on.

High citation count signals influence within this searched corpus, not necessarily current commercial dominance.
Hybrid assemblies
22 citations
bipolar + wide-bandgap filing

A second, application-specific route

A separate filing claims an electric assembly combining a bipolar switching device with a wide-bandgap transistor, offering an alternative to pure device-structure claims for systems that already use a qualified bipolar switch.

This route is more integration-specific and less broadly applicable than the vertical-structure claims.
Recent momentum
0 in latest year
across all six tracked assignees

No current filer is pulling ahead

Robert Bosch, General Electric, Infineon (Germany and Austria), Hitachi Energy Switzerland and Nexperia all report zero filings in the most recent tracked year, meaning the competitive picture here has gone static rather than being actively reshaped.

Flat momentum across every tracked holder is itself a finding — it points to a settled rather than contested claim space.
🔍
Under-claimed sub-areas worth checking before filing
Based on the thin IPC branches in this corpus relative to the dense device-structure classes
gate-driver short-circuit detection circuitsdesaturation-based fault response schemesprotective circuit arrangements (H02H)packaging-level ruggedness (H10P)
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Robert Bosch GmbH (Germany)0
General Electric Company0
Infineon Technologies AG0
Infineon Technologies Austria AG0
Hitachi Energy Switzerland AG0
Nexperia B.V.0
DYNEX SEMICON LIMITED & ZHUZHOU CSR TIMESELECTRIC0
Monolithic Power Systems (Taiwan) Co., Ltd.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this next

The filing pattern here is settled rather than active, which changes what due diligence should focus on: less on tracking a fast-moving competitor, more on mapping exactly which claim elements the foundational filings cover.

Run a full claim chart on the top-cited filings

The three most-cited records in this corpus carry disproportionate influence over later vertical-structure and hybrid-assembly designs. A claim-element breakdown of each clarifies exactly what freedom to operate looks like before committing to a device architecture.

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Check the protective-circuit branch before filing

H02H and H10P are thin relative to the dominant device-structure classes, suggesting genuine white space in gate-driver and fault-response circuit claims rather than further device-structure variants.

Explore white space in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Frequently asked questions

Answers are grounded in the same dataset. Derived from a Patsnap search on Silicon Carbide MOSFET Safety and Compliance covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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