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Silicon Nitride Ceramic Patents: Leaders, Trends & White Space 2026

Silicon Nitride Ceramic Patents: Leaders, Trends & White Space 2026
https://www.patsnap.com/resources/blog/rd-blog/silicon-nitride-ceramic-manufacturing-process-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Advanced Materials & Metallurgy
Silicon Nitride Ceramic Manufacturing Process Patents
  • Flat filing activity, not a growth curve. Filings peaked at 4 in 2023 and the midpoint year (2022) sits at 3 — this is a mature, cyclical filing pattern rather than an expanding one.
  • No single assignee is filing consistently. Recent-year momentum across tracked assignees is effectively zero except for one filer with a single record — no organisation is compounding a lead right now.
  • Sintering-additive chemistry is where the influential prior art sits. The most-cited records in this set are composite-powder and high-toughness sintering patents from the 1990s, still anchoring citation counts decades later.
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39
Published Records
49%
Top-5 Share of All Records
0%
3-Yr Growth (lag-adjusted)
EP
Leading Jurisdiction
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Field Overview

What this landscape covers

Silicon nitride ceramic manufacturing spans powder synthesis, sintering-additive selection, gas-pressure or hot-press densification, and the shaping steps — tape casting, injection moulding — that turn a sintered body into a substrate or structural part. This dataset tracks 39 patent families filed against IPC classes covering sintered ceramics (C04B35/587, C04B35/64, C04B35/626), narrowed to records whose title or claims name a silicon nitride or Si3N4 ceramic together with a gas-pressure sintering, tape-casting, sintering-additive or manufacturing-process term.

Coverage runs from 2015 through the mid-2026 data cut-off. Because publication typically lags filing by around 18 months, the most recent one or two years in any trend line will understate actual filing activity — treat 2025 and 2026 figures as provisional floors, not final counts.

Filing activity, 2017–2026
  1. 1THE DOW CHEM CO8
  2. 2NITERRA MATERIALS CO LTD3
  3. 3CERAMTEC INNOVATIVE CERAMIC ENG3
  4. 4AMOTECH CO LTD3
  5. 5HONDA MOTOR CO LTD2
  6. 6Weihai Guanhuan Advanced Ceramics Co., Ltd.2
  7. 7YANSHAN UNIV2
  8. 8OCI CO LTD(JP)2
  9. 9OCI CO LTD(KR)2
  10. 10TOKUYAMA CORP2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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The Numbers

Filing trend and technology composition

Two views of the same 39-family dataset: how filing volume has moved year over year, and which IPC subclasses the underlying documents actually sit in.

A flat, low-volume filing curve

Filings moved from 2 in 2017 to a peak of 4 in 2023, with the 2022 midpoint at 3 and 2026 (partial year) at 1. There is no sustained upward trend in this window — activity looks episodic rather than compounding, consistent with a technology where the core sintering chemistry was substantially claimed years ago and new filings address incremental process or application variants.

A flat, low-volume filing curve012342201720182019202020212022420232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

Concentrated in ceramics, with spillover into electronics substrates

Every record in this set carries a C04B (ceramics, cement, refractories) classification, as expected from the search construction. The next largest groups are C01B (non-metallic elements and inorganic compounds, 8 records) and H05K (printed circuit assemblies, 5 records), with H01L (semiconductor devices, 4) and H10W (4) close behind. That spillover into circuit-board and semiconductor classes signals that a meaningful share of this filing activity is aimed at silicon nitride as a substrate material for power electronics, not just as a bulk structural ceramic.

Concentrated in ceramics, with spillover into electronics substratesC04B · Ceramics, cement & refractories39100.0%C01B · Non-metallic elements & inorga…820.5%H05K · Printed circuits & assemblies512.8%H01L · Semiconductor devices410.3%H10W410.3%B32B · Layered products & laminates37.7%B28B · Shaping clay & cement products25.1%C09K · Materials for misc. applicatio…12.6%

Shares are the percentage of the 39 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Prior Art

Key patents and the representative claim

Representative Filing
EP0661245A31995-10-25

EP0661245A3 — Silicon nitride ceramic material (Honda)

HONDA GIKEN KOGYO KABUSHIKI KAISHA

A ceramic material composed mainly of silicon nitride, combined with a sintering additive drawn from aluminum oxide, yttrium oxide, ytterbium oxide, lanthanum oxide, neodymium oxide or cerium oxide. The mixture is sintered in a nitrogen atmosphere at a temperature above the point where the ceramic reaches maximum density, producing a sintered material with increased thermal conductivity.Filed by Honda Giken Kogyo Kabushiki Kaisha, published 1995-10-25.

EP0661245A3 — patent drawing 1
View full filing
Most-cited records in this dataset
#Publication no.Patent titleCitations
1US5525556ASilicon nitride/silicon carbide composite powders62
2US5643843ASilicon nitride/silicon carbide composite densified materials prepared using composite powders27
3US5556815AHigh temperature resistant silicon nitride ceramic21
4US5449649AMonolithic silicon nitride having high fracture toughness20
5US20090224399A1Silicon nitride substrate, method of manufacturing the same, and silicon nitride circuit board and semiconduc…12
6CN106631042A制作氮化硅陶瓷电路基板的生产工艺10
7JP2004277234ASilicon nitride ceramic porous material having vent holes and its manufacturing process10
8US4500482AMethod of manufacture silicon nitride ceramic molded articles7
9CN109574680A一种气固反应结合液相烧结法制备多孔氮化硅陶瓷的方法6
10CN101255058A一种超塑性纳米Si3N4基陶瓷材料及其制备方法6

Citation counts are drawn from a corpus that favours older, longer-indexed documents — read them as a signal of foundational influence, not of current commercial relevance.

Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Analysis

What the data means for a filing decision

Three signals stand out once family counts, IPC spread and citation concentration are read together.

Filing Volume
39 families, peak 4/yr
2015–2026

A small, stable field — not a gold rush

At a peak of 4 families in a single year and a total of 39 over more than a decade, this is a narrow, specialist filing space. Freedom-to-operate searches here are tractable by hand rather than requiring heavy analytics, but that also means each individual grant carries more relative weight in the landscape.

Peak year 2023 = 4 families
Geographic Spread
EPO 14 · US 12 · CN 8
receiving offices

Europe and the US lead filing office counts, China is rising

European and US receiving offices account for the largest shares of filings, with China at 8 and Japan, India and Canada each in single digits. For a company weighing where to seek protection, EPO and USPTO coverage tracks where most existing rights already sit — China's smaller count may reflect real white space or simply a filing lag not yet visible in a 2026 cut-off.

EPO 14, US 12, CN 8, remaining offices in single digits
Citation Concentration
62 citations, 1990s patents
top-cited record

Foundational chemistry patents still anchor the citation graph

The most-cited records in this set are composite-powder and high-fracture-toughness silicon nitride patents from the mid-1990s. Their citation counts reflect decades of indexing, not present-day relevance — but they remain the baseline prior art that any new sintering-additive or powder-composite claim will be examined against.

Top record cited 62 times
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to silicon nitride ceramic manufacturing process, with the prior art for and against each one.

Find the white space →
Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Assignee Landscape

Who is filing, and where the gaps are

No assignee in this dataset shows sustained multi-year filing momentum, and recent-year activity across tracked players is close to flat. That pattern points to a field where individual grants — rather than portfolio depth — carry the competitive weight.

Momentum
1 filing
latest year, top filer

Recent activity has nearly stalled

Of the assignees tracked for recent-year momentum, only one shows a filing in the latest year, and it is a single record. The rest show zero in the most recent year — consistent with the overall flat-to-declining trend rather than any one competitor pulling ahead.

Latest-year filings: 1 (top filer), 0 elsewhere
Portfolio Base
39 families
total tracked

A long tail rather than a concentrated leader

With 39 total families spread across research institutes, industrial ceramics makers and diversified chemical companies, ownership is dispersed. There is no single dominant portfolio holder visible in this window, which lowers the barrier for a new entrant to secure a defensible position with a modest number of well-targeted filings.

No single assignee dominates the 39-family set
Institutional Filers
Universities present
among assignees

Research institutes sit alongside industrial filers

The assignee set mixes established ceramics and materials companies with university and research-institute filers, a pattern typical of a field where sintering-additive and processing know-how still originates partly in academic labs before being licensed or commercialised.

Mixed industrial / academic assignee base
🔍
Under-claimed sub-areas worth watching
Branches with thin coverage relative to the core sintering claims
Nitrogen-atmosphere pressure profilingRare-earth oxide additive blendsTape-cast substrate lamination for power modulesLow-temperature densification routesInjection-moulded net-shape sintering
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
NITERRA MATERIALS Co., Ltd.1
The Dow Chemical Company0
OCI Company Ltd.0
Amotech Co., Ltd.0
Ceramic Technology Innovation Engineering Co., Ltd.0
Yanshan University0
Tokuyama Corporation0
Honda Motor Co., Ltd.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Next Steps

Where to take this analysis

This landscape identifies the filing pattern and the citation anchors. The next layer of work is claim-level: mapping specific sintering-additive ratios and process windows against what is already granted.

Run a claim-level freedom-to-operate check

With only 39 families in scope, a full claim chart against the most-cited records is feasible before committing to a specific additive chemistry or sintering profile.

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Track the under-claimed branches

Substrate lamination and low-temperature densification show thinner coverage than the core sintering claims — worth monitoring for new entrants filing into that gap.

Set up monitoring in Patsnap Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on silicon nitride ceramic manufacturing patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Silicon Nitride Ceramic Manufacturing Process covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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