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Single Photon Avalanche Diode Technology Landscape 2026

Single Photon Avalanche Diode Technology Landscape 2026
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SPAD Patent Landscape

Single Photon Avalanche Diode Technology Landscape 2026

SPADs enable detection of individual photons with picosecond-level timing resolution, driving applications from automotive LiDAR to quantum communications. Approximately 60% of active patent filings in this dataset were published after 2019, confirming accelerating commercialization.

80+
Patent and literature records in this dataset
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57%
PDE achieved by Sony’s 3.06 μm SPAD pixel (2023)
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7.8 ps
FWHM timing resolution at 65 nm node (Université de Sherbrooke, 2018)
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60%
Active patent filings published after 2019 in this dataset
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Published byPatSnap Insights Team··12 min readVerified by PatSnap Eureka Data
Technology Overview

SPAD Innovation: From Foundational Physics to Megapixel Arrays

Single Photon Avalanche Diodes are reverse-biased p-n junction photodetectors biased above breakdown voltage, where a single photo-generated carrier triggers a macroscopic, detectable current pulse. Key performance metrics include photon detection efficiency (PDE), dark count rate (DCR), timing jitter (FWHM), afterpulsing probability, and fill factor.

The dataset spans foundational silicon CMOS implementations through advanced III-V compound semiconductor structures and emerging 2D material platforms. Device geometries range from single-pixel discrete detectors to megapixel focal plane arrays. Circuit integration—particularly quenching and reset circuits—is a co-equal design challenge alongside the diode structure itself.

SPAD Patent Filings by Top Assignees in This Dataset
SPAD Patent Filings by Top Assignees: STMicroelectronics 3, Adaps Photonics 4, PixArt Imaging 3, KU Leuven 1, AMS AG 1Horizontal bar chart showing retrieved active patent counts per top SPAD assignee in this dataset, based on patent records spanning 2019–2025.Adaps Photonics4STMicroelectronics3PixArt Imaging3KU Leuven / AMS AG1 each↗ Click bars to explore

The field divides into three epochs across 80+ retrieved records. The foundational era (pre-2008) established avalanche multiplication principles and early integrated readout architectures. The CMOS integration era (2008–2019) made standard CMOS compatibility the dominant design goal. The optimization and scaling era (2020–present) is defined by pixel pitch reduction and advanced node integration.

Sony Semiconductor Solutions demonstrated a 3.06 μm pixel-pitch SPAD with 57% PDE and deep trench isolation in 2023. STMicroelectronics filed active SPAD patents for 28 nm FD-SOI technology in 2021 and avalanche pixel control circuits in 2024–2025. Adaps Photonics filed multiple US and WO patents for bonded-substrate SPAD arrays between 2021 and 2023.

PatSnap Eureka Data derived from patent and literature records retrieved in this dataset; filing counts reflect records retrieved, not a comprehensive industry survey.Explore the data ↗
Patent Data Analysis

Technology Cluster Distribution and CMOS Node Progression

Four technology clusters emerge from this dataset: standard CMOS-integrated silicon SPADs, enhanced-architecture NIR SPADs, III-V and heterogeneous material SPADs, and large-format SPAD arrays. Each cluster reflects distinct engineering trade-offs and application targets.

SPAD Technology Cluster Distribution by Retrieved Record Count

Standard CMOS-integrated silicon SPADs form the largest cluster, reflecting the dominant design goal of CMOS process compatibility across the dataset.

SPAD Technology Cluster Distribution: CMOS Silicon 32 records, SPAD Arrays 24 records, III-V and Heterogeneous 20 records, NIR Enhanced Silicon 16 recordsHorizontal bar chart showing distribution of retrieved patent and literature records across four SPAD technology clusters in this dataset.CMOS Silicon SPADs32SPAD Arrays & FPAs24III-V & Heterogeneous20NIR Enhanced Silicon16↗ Click bars to explore

SPAD Publication Activity by Epoch (Pre-2008, 2008–2019, 2020–2025)

The optimization and scaling era (2020–present) accounts for approximately 60% of active patent filings in this dataset, reflecting accelerating commercialization activity.

SPAD Activity by Era: Foundational pre-2008 low activity, CMOS Integration 2008-2019 moderate, Optimization and Scaling 2020-2025 highest activity at ~60% of active patentsVertical bar chart showing relative SPAD patent and literature activity across three innovation epochs identified in this dataset.~10%Pre-2008~30%2008–2019~60%2020–2025↗ Click bars to explore
PatSnap Eureka Epoch distribution estimated from publication dates across 80+ retrieved patent and literature records in this dataset.Explore the data ↗
Application Domains

Key SPAD Application Verticals: LiDAR, Biophotonics, Quantum, and Beyond

SPAD technology serves multiple distinct application domains in this dataset, each demanding specific device parameter trade-offs. The four primary verticals—automotive LiDAR, biophotonics and medical imaging, quantum communications, and high-energy physics—are detailed below with named institutions and measured results.

Time-of-Flight · CMOS Integration · Array Format

Automotive LiDAR and 3D Ranging

The most commercially active application domain in this dataset. Hewlett Packard Labs (2019) demonstrated a P+/N-well junction SPAD in 0.18 μm CMOS with breakdown voltage below 10 V, explicitly targeting cost and voltage minimization for LiDAR. Southwest Institute of Technical Physics fabricated 64×64 Si SPAD and InGaAsP/InP SPAD focal plane arrays for driverless vehicle LADAR platforms (2018).

Automotive Sensing
FLIM · PET · SiPM · Lens-free Imaging

Biophotonics and Medical Imaging

EPFL AQUA (2019) reviewed SPAD-based endoscopic FLIM, super-resolution microscopy, NIROT, and PET implementations with pixel-level time-stamping. Fondazione Bruno Kessler’s NUV-HD SiPM achieved 63% PDE at 420 nm with 75–100 ps coincidence resolving time for PET scintillator readout. Columbia University (2016) demonstrated a 72×60 angle-sensitive SPAD array for lens-free 3D fluorescence lifetime mapping at micrometer scale.

Medical Imaging
QKD · Telecom Wavelength · Room Temperature

Quantum Communications and Photonics

IFN-CNR / Politecnico di Milano (2020) benchmarked SPAD performance against superconducting nanowire single-photon detectors, identifying SPAD advantages in room-temperature operation and scalability. University of Geneva (2007) demonstrated free-running InGaAs/InP SPAD operation with 10% detection efficiency at less than 2 kHz noise for fiber-optic quantum key distribution. National University of Singapore (2013) confirmed radiation tolerance of Si APDs for satellite-based quantum communication at 400 km orbit.

Quantum Photonics
Particle Tracking · Picosecond Timing · Space Arrays

High-Energy Physics and Space Astronomy

University of Geneva (2022) developed a Picosecond Avalanche Detector proof-of-concept in 130 nm SiGe BiCMOS for charged-particle tracking with picosecond timestamps, while University of Barcelona (2010) compared HV 0.35 μm vs. 0.13 μm CMOS for particle collider tracking detectors. University of Hawaii (2022) tested a 1-megapixel HgCdTe linear-mode APD array at 50 K achieving approximately 3 electrons per pixel per kilosecond dark current for exoplanet spectroscopy.

Physics and Astronomy
PatSnap Eureka Application domain examples drawn from named patent and literature records retrieved in this dataset spanning 2007–2023.Explore insights ↗
Key Patent Assignees

Leading SPAD Patent Assignees in This Dataset

Among active patent filings retrieved, STMicroelectronics and Adaps Photonics show the highest SPAD-specific activity. STMicroelectronics spans device structures to advanced-node quenching circuits, while Adaps Photonics concentrates IP on a specific bonded-substrate 3D integration platform.

Top SPAD Patent Assignees by Retrieved Filing Count

Top SPAD Assignees: Adaps Photonics 4 filings, STMicroelectronics 3, PixArt Imaging 3, AMS AG 1, KU Leuven 1Horizontal bar chart of retrieved active SPAD patent counts per top assignee in this dataset, 2019–2025.Adaps Photonics Inc.4STMicroelectronics R&D3PixArt Imaging Inc.3AMS AG1KU Leuven Research & Development1↗ Click bars to explore
CMOS SPAD Device · Advanced Node Quenching · Avalanche Pixel Control

STMicroelectronics R&D Limited

STMicroelectronics is the most prolific commercial SPAD patent assignee in this dataset, with at least 3 active patents spanning 2019–2025 across EP and FR jurisdictions. Key filings include a deep n-well/p-substrate SPAD for CMOS circuits (EP, 2020), a 28 nm FD-SOI active quenching and reset circuit enabling sub-40 ps avalanche detection and 50% afterpulsing reduction (2021), and avalanche pixel control circuit patents filed in 2024–2025 in France. Their IP trajectory covers CMOS node migration from standard process through advanced FD-SOI technology.

Europe — EP / France — FR
Bonded Substrate SPAD Array · 3D Stacked Integration · Sensor-Logic Architecture

Adaps Photonics Inc.

Adaps Photonics filed 4 retrieved active patents between 2021 and 2023 across US and WO jurisdictions, all covering bonded logic-sensor substrate SPAD array architectures. This concentrated IP cluster—spanning US (2021, 2022, 2023) and WO (2021) filings—indicates a focused strategy around a specific 3D stacked-die platform that decouples optical optimization of the SPAD from transistor scaling of the readout logic. All 4 retrieved patents carry active legal status.

United States — US / WO
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This dataset also includes active filings from PixArt Imaging (3 image sensor patents, 2023–2025), AMS AG metal aperture control (EP, 2020), United Microelectronics Corp. SOI-substrate SPAD (US, 2022), and Sony Semiconductor Solutions’ 3.06 μm pixel with 57% PDE. Full ranked profiles available in PatSnap Eureka.
PixArt Imaging filings Sony SPAD pixel IP + more
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PatSnap Eureka Assignee data derived from active patent records retrieved in this dataset; counts reflect retrieved records only.Explore players ↗
Emerging Directions

Five Forward-Looking SPAD Innovation Directions (2022–2025)

Based on the most recent filings and publications in this dataset, five forward-looking directions are identifiable: sub-4 μm pixel pitch arrays, advanced CMOS node integration, 3D stacked sensor-logic architectures, metasurface and photon-trapping nanostructures, and Sb-based or Ge/GeSn heterogeneous SPADs for SWIR.

Sub-4 μm Pixel Pitch SPAD Arrays Approaching DRAM-Class Scaling

Sony Semiconductor Solutions demonstrated a 3.06 μm SPAD pixel with 57% PDE, 0.4% crosstalk, and 15.8 cps DCR using two-step deep trench isolation and an embedded metal optical shield (2023). This trajectory points toward megapixel SPAD sensors competitive with conventional image sensors for consumer and automotive applications. Pixel pitch is now the primary competitive metric in high-resolution photon counting imaging.

28 nm FD-SOI Integration Enabling Sub-40 ps Avalanche Detection

STMicroelectronics’ 28 nm FD-SOI active quenching and reset circuit (2021) uses body biasing to detect avalanche events in under 40 ps and reduce afterpulsing charge by 50%. Subsequent avalanche pixel control circuit patents filed in 2024–2025 signal that advanced node integration is becoming commercially deployable. This CMOS node migration is identified as the primary competitive battleground for cost-sensitive high-volume markets.

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Unlock Metasurface and Photon-Trapping Nanostructure Emerging IP Analysis
The metasurface SPAD approach (China Jiliang University, 2020) and photon-trapping nanostructure work (UC Davis, 2022) both decouple photon absorption enhancement from device structure, enabling PDE improvements without degrading DCR or jitter. Full emerging direction analysis is available in PatSnap Eureka.
Metasurface SPAD patentsPhoton-trapping nanostructures+ more
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PatSnap Eureka Emerging direction signals derived from publications and filings dated 2022–2025 in this dataset.Explore emerging trends ↗
Technology Comparison

Silicon CMOS SPADs vs. III-V Compound Semiconductor SPADs

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DimensionSilicon CMOS SPADsIII-V Compound SPADs
Wavelength Range300–1000 nm (silicon bandgap limited); NIR enhanced variants up to ~1000 nm1310/1550 nm telecom (InGaAs/InP, InGaAs/InAlAs); UV (GaN/AlN); SWIR up to 2.5 μm (Sb-based, Ge/GeSn)
Peak PDE57% at 3.06 μm pixel pitch (Sony, 2023); 63% at 420 nm for NUV-HD SiPM (FBK, 2019); ~20% at 785 nm in 180 nm CMOS26% at 1550 nm at 210 K (University of Sheffield, 2016); 38% SPDE at 1310 nm at 125 K (Ge-on-Si, University of Glasgow, 2019)
Timing Jitter7.8 ps FWHM at 65 nm node (Université de Sherbrooke, 2018); 100 ps CRT for PET readout (FBK)70 ps at 1550 nm (InGaAs/InAlAs, University of Sheffield, 2016)
Operating TemperatureRoom temperature standard; DCR below 10 kHz at 15°C in 180 nm CMOS (ICube/CNRS, 2016)Typically requires cooling: 210 K for InGaAs/InAlAs (Sheffield, 2016); 125 K for Ge-on-Si (Glasgow, 2019); 50 K for HgCdTe (Hawaii, 2022)
CMOS CompatibilityMonolithic integration demonstrated at 65 nm, 130 nm, 180 nm, 350 nm nodes; zero-change 0.18 μm process (HP Labs, 2019)Not directly CMOS compatible; requires heterogeneous integration or separate fabrication; Ge-on-Si approaches CMOS compatibility
Afterpulsing0.2% in 180 nm CMOS (ICube/CNRS, 2016); 50% reduction via FD-SOI body biasing in sub-40 ps detection (STMicroelectronics, 2021)InAlAs avalanche region shows reduced afterpulsing vs. InP; Ge-on-Si achieves significantly reduced afterpulsing vs. InGaAs/InP (Glasgow, 2019)
Key Commercial AssigneesSTMicroelectronics, Sony Semiconductor Solutions, Adaps Photonics, PixArt Imaging, AMS AGUniversity of Sheffield, University of Glasgow (research stage); KETEK GmbH (SiPM)
Pixel Pitch ScalingDown to 3.06 μm demonstrated (Sony, 2023); approaching DRAM-class scalingN/A — pixel pitch scaling not a primary reported metric in retrieved III-V literature
PatSnap Eureka Comparison data derived entirely from named patent and literature records retrieved in this dataset.Compare in Eureka ↗
Frequently asked questions

Frequently Asked Questions: SPAD Technology and Patents

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Data and insights on this page are based on a limited patent and literature dataset and are for reference only. Figures may not represent the complete technology landscape.

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