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Thin Wafer Handling Patents: Top Companies & Filing Trends 2026

Thin Wafer Handling Patents: Top Companies & Filing Trends 2026
https://www.patsnap.com/resources/blog/rd-blog/thin-wafer-handling-in-cell-production-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Solar Manufacturing Equipment
Thin Wafer Handling in Cell Production: Patents, Leaders and Filing Trends
  • 35.9% of all 92 records sit with just five assignees, but the ranked list runs to 55 companies — concentration at the top with a long tail below it.
  • Filings grew 25% from 2021 to 2024, the last year the dataset treats as complete, after peaking at 11 records in 2019.
  • H01L covers 75.0% of records while adjacent classes like B32B, C09J and C23C each sit under 7% — an indicator of where claim space is still thin.
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92
Published Records
36%
Top-5 Share of All Records
+25%
Filing Growth 2021→2024
CN
Leading Jurisdiction

Filing growth compares 2021 (4 records) with 2024 (5) — a three-year span. 2024 is the most recent year we treat as complete: publication lags filing by roughly 18 months, so 2025 onwards are still filling in and any growth rate that ends there would understate the field. Top-5 share is the combined record count of the five largest assignees divided by all 92 records in scope (CR5), not by the ranked leaders only.

Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What the patent record shows

Thin wafer handling covers the mechanics of moving, supporting and processing silicon wafers thin enough to bow, warp or crack under their own weight and under contact forces from belts, vacuum chucks and carriers. The 92 records in scope span filings from 2015 through the current data cut-off, concentrated overwhelmingly in H01L semiconductor device classifications, with smaller but persistent clusters in laminates, adhesives, coatings and measurement classes that support carrier and release-layer approaches.

Filing activity peaked in 2019 and has since settled into a lower but still-active band, with 2021-to-2024 growth of 25% suggesting renewed interest even as the field's biggest single-year peak sits several years back. Publication lags filing by roughly 18 months, so the most recent one or two years in the trend understate real activity.

Filing activity by year, 2017–2026
  1. 1BREWER SCIENCE INC19
  2. 2JINGAO SOLAR CO LTD6
  3. 3ADEIA SEMICON TECH LLC4
  4. 4XIANGNENG HUALEI OPTOELECTRONICS2
  5. 5JIANGXI SAI WEI LDK SOLAR HI TECH CO LTD2
  6. 6HERCULES TECH GROWTH CAPITAL2
  7. 7BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC2
  8. 8ZHONGHUAN ADVANCED SEMICONDUCTOR TECHNOLOGY CO LTD2
  9. 9EGING PHOTOVOLTAIC TECHNOLOGY CO LTD2
  10. 10BEIJING UNIV OF TECH2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Data

Filing trends and technology composition

Two views of the same 92 records: how filing activity has moved year over year, and which IPC subclasses carry the claim density.

Filing trend, 2017–2026

Filings rose to a peak of 11 in 2019, cooled, then grew 25% from 2021 (4) to 2024 (5) — the last year the dataset treats as complete. 2025 and 2026 figures are still filling in behind the publication lag.

Filing trend, 2017–202603691232017201811201920202021202220232024202512026Most recent year is partial — publication lag means later filings are not yet visible.

IPC subclass composition

H01L (semiconductor devices) appears in 75.0% of the 92 records, with H10P present in 23.9%. Smaller shares in B32B, B08B, C08G, C09J, C23C and G01R (each 4.3%–6.5%) mark supporting materials and process classes rather than a second major cluster.

IPC subclass compositionH01L · Semiconductor devices6975.0%H10P2223.9%B32B · Layered products & laminates66.5%B08B · Cleaning (general)44.3%C08G · Condensation polymers44.3%C09J · Adhesives44.3%C23C · Coating & surface deposition44.3%G01R · Electric & magnetic measurement44.3%Other4144.6%

Shares are the percentage of the 92 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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Key Patents

Most-cited records and a representative filing

Representative Filing
US8232140B22012-07-31

US8232140B2 — Method for ultra thin wafer handling and processing

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

A method for thin wafer handling and processing is provided. In one embodiment, the method comprises providing a wafer having a plurality of semiconductor chips, the wafer having a first side and a second side. A plurality of dies are attached to the first side of the wafer, at least one of the dies are bonded to at least one of the plurality of semiconductor chips. A wafer carrier is provided, wherein the wafer carrier is attached to the second side of the wafer. The first side of the wafer and the plurality of dies are encapsulated with a planar support layer.Filed by Taiwan Semiconductor Manufacturing Company, Ltd., this filing frames a carrier-attach-and-encapsulate sequence that recurs across later filings in the space.

US8232140B2 — patent drawing 1US8232140B2 — patent drawing 2
View full record
Highest-cited records in scope
#Publication no.Patent titleCitations
1US7100954B2Ultra-thin wafer handling system56
2US20050110291A1Ultra-thin wafer handling system37
3US20160023436A1Polyimides as laser release materials for 3-d IC applications32
4US20150194331A1Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding process…29
5CN202601629U晶体硅太阳能电池22
6CN201529636U硅片鼓泡清洗装置20
7CN105215838A一种蓝宝石晶片的研磨装置及其研磨方法19
8CN102623372A一种湿硅片自动分片装置17
9CN114664720A晶圆校正系统及半导体工艺设备14
10US20170040200A1Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding process…14

Citation counts reward older filings that have had more time to accumulate citations inside the searched corpus; treat them as a signal of influence, not of which claims matter most today.

Patent titles are shown in the language they were filed in, not translated, so that each record stays verifiable against the original filing — a translated title will not match in Eureka or in any national register. Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for filing strategy

Reading the concentration, class composition and citation pattern together points to where claim space is occupied and where it is not.

Concentration
35.9% of 92 records
held by top 5 assignees

The top of the field is dense, the rest is thin

Five assignees hold 35.9% of all 92 records in scope, and the top 10 combined reach 46.7%. Below that the ranked list runs to 55 companies, most with only one or two filings — a long tail rather than a second concentration point.

Ranked leaders, not a top-50 or top-100 list.
Filing momentum
+25%, 2021→2024
growth over the last complete window

Growth after a 2019 peak, not before it

The field peaked at 11 filings in 2019, then cooled before rebuilding: 2021 to 2024 growth reached 25%. Because 2025 and 2026 are still filling in behind the publication lag, that later dip should not be read as a slowdown yet.

2024 is the last year treated as complete.
Class composition
75.0% in H01L
of all 92 records

One class dominates, several sit at the margin

H01L covers three-quarters of records, with H10P present in under a quarter. Laminates, adhesives, coatings and measurement classes each sit near 4-7%, which points to a field defined mainly by device-level claims rather than a wide spread of materials or process approaches.

Classes overlap; shares sum to more than 100%.
Filing origin
56 of 92 via China
receiving office split

China dominates the receiving-office mix

China accounts for 56 of the 92 records, well ahead of the United States at 17 and EPO at 8. WIPO PCT filings sit at 6, indicating that most applicants are not yet pursuing broad multi-jurisdiction protection for this specific technology.

Receiving office counts, not family counts.
Eureka AI Agent
Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to thin wafer handling in cell production, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who is filing, and where the gate sits

The leader holds 19 records, more than double the fifth-place assignee's 2 — a steep drop after the top position rather than a gradual taper.

Leader
19 records
top assignee

A single leader well ahead of the field

The leading assignee holds 19 records against a fifth-place figure of just 2, meaning the gap between first and the rest of the top five is far larger than the gap within the top five itself.

Counted in records, not families.
Mid-field
2 records
fifth and tenth place

A flat mid-field below the leader

Fifth place and tenth place both sit at 2 records, meaning the mid-field is flat rather than sloped — there is no clear second-tier leader distinguishing itself from the rest of the top ten.

Top 10 combined: 46.7% of 92 records.
Collaboration
2 co-assignee pairs
across the dataset

Very little joint filing

Only two co-assignee pairs appear across the dataset, both linking related corporate entities rather than independent partners, suggesting most patenting here happens within a single organisation rather than through joint development.

Strongest pair recurs twice.
🔍
Under-claimed sub-areas
Branches with thin filing density relative to the core H01L cluster
Vacuum chuck contact-force controlBelt-transport microcrack propagation monitoringBow/warp inline measurement integrationRelease-layer adhesive chemistry for ultra-thin stacksCarrier-free thin wafer transport
Rank all filers by momentum →
Recent-year filing momentum
AssigneeRecent yearYoY
Brewer Science, Inc.0
JA Solar Co., Ltd.0
Invensas Corporation0
CSI Solar Power (Luoyang) Co., Ltd.0
Suzhou CSI Solar Power Technology Co., Ltd.0
Baoding Baili Solar Photovoltaic Co., Ltd.0
Xiangneng Hualei Optoelectronics Co., Ltd.0
Taijing Technology Co., Ltd.0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The dataset points to specific next steps depending on whether the goal is freedom-to-operate, sourcing or R&D scoping.

Check freedom-to-operate against the leader's claims

With one assignee holding 19 records against a fifth-place count of 2, any new filing in this space should be checked against that leader's claim scope before development goes further.

Explore claims in Eureka →

Scope the under-claimed branches

Vacuum contact control, microcrack monitoring and release-layer chemistry each carry far fewer filings than the core H01L cluster, making them candidates for faster, less-contested filing.

Map white space in Eureka →

Track the post-2024 filing signal carefully

Because 2025 and 2026 figures are still filling in behind the roughly 18-month publication lag, treat any apparent slowdown in those years as incomplete data rather than a real trend.

Monitor filing trends in Eureka →
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions on thin wafer handling patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Thin Wafer Handling in Cell Production covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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