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Ultrafast Laser Patent Landscape 2026

Ultrafast Laser Patent Landscape 2026
Competitive Landscape

Ultrafast Laser Patent Landscape in 2026

Hamamatsu Photonics leads a moderately concentrated field spanning 8,165 patent families, with the top five filers holding 22% of the hundred largest filers’ combined total. Annual filings peaked in 2020 and have eased since, though the multi-year base remains substantial across manufacturing, optics, and medical applications.

8,165
Patent families in scope
22%
Top-5 share of top-100 filers
-18%
3-yr filing growth (lag-adj.)
United States
Leading jurisdiction
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Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

Hamamatsu leads a fragmented field with a clear tier gap at the top

Hamamatsu Photonics holds the leading position with 601 patent families, nearly double the second-ranked IMRA America (342 patent families) and almost twice the third-ranked CNRS (322 patent families). This gap between first and second place is the most pronounced in the ranking.

The top five filers — Hamamatsu Photonics, IMRA America, CNRS, Alcon, and Beijing Institute of Technology — account for 22% of the hundred largest filers’ combined total, indicating moderate concentration at the apex with a long, competitive tail of challengers.

Leading applicants
#ApplicantPatent familiesShare
1Hamamatsu Photonics K.K.601
2IMRA America Inc342
3French National Centre for Scientific Research (CNRS)322
4Alcon Inc225
5Beijing Institute of Technology199
6Electro Scientific Industries Inc199
7Corning Inc165
8Applied Materials Inc157
9SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE A…154
10Max Planck Gesellschaft zur Förderung der Wissenschaften141
#ApplicantPatent familiesShare
11Rofin-Sinar Technologies LLC134
12Coherent Inc119
13Massachusetts Institute of Technology111
14National Research Council of Canada111
15Xi’an Jiaotong University109
16Université Jean Monnet Saint-Étienne104
17Sumitomo Electric Industries Ltd104
18Carl Zeiss Meditec AG102
19IPG Photonics Corporation97
20Alcon LenSx Inc96
↗ Hover a row · click a company to ask Eureka

The leader’s scale in laser-material processing and semiconductor device fabrication, combined with IMRA America’s laser physics depth, establishes a high barrier in core ultrashort-pulse generation and precision machining. Challengers from academia (CNRS, MIT, Max Planck) and industry (Corning, Applied Materials) compete across distinct application verticals rather than a single front.

Filings from roughly 2024 onward are under-counted due to standard patent-publication lag; apparent softness at the trailing edge of the trend should not be read as a structural shift until more applications publish. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Post-2020 easing and a manufacturing-dominated technology mix

The annual filing trend shows a build-up through 2020 followed by a gradual retreat, while the IPC breakdown reveals welding and optical-systems branches as the dominant technical anchors across the corpus.

Annual filing trend

Filings climbed from 639 families in 2017 to a peak of 1,127 in 2020, then retreated to the 800–1,000 range through 2022–2023. The 2024–2026 bars are materially under-counted due to publication lag and should not be interpreted as a continuation of the decline.

Annual filing trendAnnual values from 2017 to 2026, peaking at 1,127 in 2020.639201788120181,09020191,127202098920211,0292022812202377420247502025742026↗ Hover for values · click a bar to ask Eureka

Technology composition

B23K (welding, soldering and brazing) and G02B (optical elements and systems) together dominate the IPC mix, reflecting ultrafast lasers’ primary deployment in precision material processing and beam-delivery optics. H01S (lasers and stimulated emission) ranks third, capturing core source technology. Smaller but meaningful clusters appear in G02F (optical control), H01L (semiconductor devices), G01N (material analysis), A61F (implants and prostheses), and C03B (glass manufacture), signalling active diversification into medical and advanced-materials applications.

Technology compositionB23K · Welding, soldering & brazing leads with 7,152; G02B · Optical elements & systems 6,379.B23K · Welding, solderin…7,152G02B · Optical elements …6,379H01S · Lasers & stimulat…4,342G02F · Optical control &…1,501H01L · Semiconductor dev…1,355G01N · Material analysis…962A61F · Implants & prosth…792C03B · Glass manufacture…627↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20210283722A1Published 2021-09-16

Device and method for precessing micro-channel on …

Chongqing Institute Of East China Normal University

A method for processing a micro-channel of a micro-fluidic chip using multi-focus ultrafast laser, in which an array-type multi-focus femtosecond laser is used to perform fractional ablation on the micro-fluidic chip, and then pulse laser is used to perform secondary ablation on the micro-fluidic chip. Ultrasonic-assisted hydrofluoric acid etching is… (excerpt from the patent abstract)

Device and method for precessing micro-channel on … — patent drawingDevice and method for precessing micro-channel on … — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
13D positioning of augmented reality information2,087
2Method for controlling configuration of laser indu…824
3Ultrashort pulse high repetition rate laser system…707
4Video display modification based on sensor input f…615
5Single-mode amplifiers and compressors based on mu…581
6See-through display with an optical assembly inclu…508
7Method and apparatus for high precision variable r…488
8Laser processing method and laser processing appar…485

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the patent structure means for R&D investment decisions

The combination of a post-peak lifecycle, moderate top-tier concentration, strong French and German academic networks, and US-led geographic filing creates a nuanced competitive environment where application-specific niches remain accessible.

Decline

Field is past its 2020 peak; core sub-domains are well-covered

Annual filing volume peaked in 2020 and has eased since, placing the field in a post-peak phase on a multi-year basis. The multi-year base remains large at 8,165 patent families. Teams entering core pulse-generation or laser-machining sub-domains will encounter dense prior art; adjacent application areas such as medical implants and glass shaping carry comparatively lower density.

Post-peak · 2020
Concentration

Moderate apex concentration with a competitive second tier

The top five filers account for 22% of the hundred largest filers’ combined total, and Hamamatsu’s 601-family lead over IMRA America’s 342 represents a meaningful but not insurmountable gap. Below the top five, rankings from sixth (Electro Scientific Industries, 199 families) through twentieth (Alcon LenSx, 96 families) are tightly spaced, meaning the challenger tier is competitive and no single firm has locked up a secondary application domain.

22% top-5 share
Collaboration

CNRS anchors a dense French academic network; Max Planck–LMU pairing is notable

The most active co-filing pair is CNRS with Université Jean Monnet Saint-Étienne at 104 joint families, making this the strongest bilateral collaboration in the dataset. CNRS also co-files extensively with Centre Stephanois de Recherches Mécaniques (49 families), Manucor Technologies (47 families), Aix-Marseille Université (30 families), École Normale Supérieure (28 families), INSERM (26 families), and CEA (20 families), forming a broad French public-research cluster. Separately, Max Planck Gesellschaft and Ludwig Maximilian University Munich co-file in 61 families, anchoring German academic output. Beijing Institute of Technology and Tsinghua University collaborate in 24 families, representing the leading China-based pairing.

CNRS-led ecosystem
Geography

US leads filing volume; China is the active second jurisdiction

The United States accounts for the largest share of patent records, followed by China and then Europe via the EPO. WIPO PCT filings rank fourth, indicating broad international-protection strategies among leading filers. Germany and Japan also appear as significant individual country offices. This distribution means freedom-to-operate analysis must cover at minimum the US, China, and EPO jurisdictions for any commercial ultrafast laser product.

US · CN · EPO core
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Top collaboration links
ApplicantCollaboratorCo-filings
French National Centre for Scientific Research (CNRS)Université Jean Monnet Saint-Étienne104
Max Planck Gesellschaft zur Förderung der WissenschaftenLudwig Maximilian University of Munich61
French National Centre for Scientific Research (CNRS)Centre Stephanois de Recherches Mécaniques Hydromécanique et Frottement49
French National Centre for Scientific Research (CNRS)Manucor Technologies47
French National Centre for Scientific Research (CNRS)Aix-Marseille Université30
French National Centre for Scientific Research (CNRS)École Normale Supérieure Paris28
French National Centre for Scientific Research (CNRS)INSERM (French National Institute of Health and Medical Research)26
Beijing Institute of TechnologyTsinghua University24
French National Centre for Scientific Research (CNRS)École Polytechnique23
French National Centre for Scientific Research (CNRS)CEA (Commissariat à l’énergie atomique et aux énergies alternatives)20

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Insights are grounded in the applicant ranking, collaboration pairs, lifecycle stage, and jurisdiction filing data.Explore insights →
Leaders

Hamamatsu dominates processing; IMRA America leads laser-source science

The two largest filers occupy distinct technical niches: Hamamatsu anchors precision material processing and semiconductor fabrication, while IMRA America concentrates on fiber-laser physics and beam delivery. Both show declining recent momentum from a larger historical base.

Leader · Hamamatsu Photonics

Hamamatsu Photonics

With 601 patent families, Hamamatsu Photonics holds the largest portfolio in this landscape. Its technology focus centres on B23K 26 (laser material processing), H01L 21 (semiconductor device fabrication), and B28D 5 (stone and hard-material working), indicating a strong orientation toward precision industrial and semiconductor applications. Recent filing momentum has contracted sharply (trend: –75% versus prior period), suggesting the portfolio is maturing rather than expanding aggressively.

families: 601
Challenger · IMRA America

IMRA America

IMRA America’s 342-family portfolio is concentrated in H01S 3 (laser and stimulated emission physics), B23K 26 (laser processing), and G02B 6 (optical fiber and beam delivery), reflecting deep expertise in fiber ultrafast laser sources rather than end-use processing systems. Momentum data for IMRA America is not broken out in the applicant-momentum evidence available, so trajectory assessment is evidence pending for this specific metric.

families: 342
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
Hamamatsu Photonics K.K.13▼ -75%
French National Centre for Scientific Research (CNRS)23▼ -74%
Beijing Institute of Technology50▼ -25%
Corning Inc16▼ -6%
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences24▼ -35%
Max Planck Gesellschaft zur Förderung der Wissenschaften14▲ +17%
Rofin-Sinar Technologies LLC1▲ new entrant
Source: PatSnap Eureka. Portfolio counts are at the patent-family level; technology emphasis is derived from IPC sub-class concentration data.Explore players →
Adjacent Branches

Under-served branches worth monitoring for targeted entry

Several IPC classes appear at lower relative density compared to the dominant B23K and G02B clusters, representing adjacent areas where ultrafast laser IP activity exists but has not yet consolidated. These observations reflect relative sparsity, not confirmed commercial gaps.

G02F · Optical control and modulation

With a 5% relative share among the whitespace candidates, G02F covers active optical components such as modulators, switches, and nonlinear crystals that are integral to ultrafast pulse shaping and compression. The branch sits adjacent to the dominant G02B optical-systems cluster but has a lower filing density, and the Shanghai Institute of Optics and Fine Mechanics is among the few filers with notable activity here (G02F 1, 35 families). Teams developing intracavity modulators or nonlinear frequency-conversion stages for next-generation sources may find more navigable prior-art landscapes in this branch.

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G01N · Material analysis and testing

G01N captures ultrafast laser spectroscopy, pump-probe diagnostics, and laser-induced breakdown spectroscopy (LIBS), areas where ultrafast pulses enable time-resolved material characterisation beyond conventional techniques. At a 3% relative share among the whitespace candidates, this branch is less densely occupied than manufacturing or core optics classes. Max Planck Gesellschaft shows focused activity in G01N 21, and the branch has plausible entry paths for groups combining ultrafast sources with analytical instrumentation, particularly in semiconductor metrology and life-science imaging.

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The complete analysis covers all five flagged adjacent branches plus claim-level gap mapping across the top 20 applicants.
A61F · Implants and prosthesesC03B · Glass manufacture and shaping+ more
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Source: PatSnap Eureka. Adjacent-branch candidates are drawn from IPC classes with lower relative filing density within the corpus.Explore emerging →
Route Matrix

How leading applicants differ across key technology routes

Strength of each leader across the main technology routes.

PlayerB23K 26 · Welding, soldering & brazingH01S 3 · Lasers & stimulated emissionG02B 6 · Optical elements & systemsG02F 1 · Optical control & modulationG02B 27 · Optical elements & systems
Hamamatsu Photonics K.K.Strong · 507AbsentAbsentModerate · 153Emerging · 22
IMRA America IncModerate · 114Strong · 231Moderate · 77Moderate · 54Absent
French National Centre for Scientific Research (CNRS)Strong · 110Strong · 57Moderate · 50Moderate · 37Emerging · 15
Electro Scientific Industries IncStrong · 140Moderate · 58AbsentAbsentAbsent
Corning IncStrong · 132AbsentModerate · 47AbsentAbsent
Alcon IncAbsentStrong · 85AbsentStrong · 66Moderate · 25
Beijing Institute of TechnologyStrong · 171AbsentAbsentAbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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