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Vat Photopolymerization Patents: Leaders, Trends & White Space 2026

Vat Photopolymerization Patents: Leaders, Trends & White Space 2026
https://www.patsnap.com/resources/blog/rd-blog/vat-photopolymerization-technology-landscape-patent-landscape/ · Patsnap · data cut-off 2026-07-31 · downloaded from the live page
Patent Landscape · Additive Manufacturing
Vat Photopolymerization Patents: Who Leads and Where Filing Has Slowed
  • Filing peaked in 2019 at 62 families, then declined toward flat single digits by 2022 — this is a maturing claim space, not a growing one.
  • B29C and B33Y cover nearly all records, but only 11 records touch G03F photolithography, leaving light-engine and exposure-optics claims comparatively open.
  • The United States receives roughly half of all filings, with WIPO PCT and EPO together adding another third — file strategy here is dominated by a US-first, PCT-second pattern.
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184
Published Records
86%
Top-5 Share of All Records
-77%
3-Yr Growth (lag-adjusted)
US
Leading Jurisdiction
Published byPatsnap Research··7 min readSourced from Patsnap Eureka
Overview

What the vat photopolymerization patent record shows

Vat photopolymerization covers stereolithography, digital light processing (DLP) and continuous liquid interface production (CLIP) — processes that cure a liquid photopolymer layer by layer with light. The dataset behind this page spans 184 patent families filed between 2015 and mid-2026, concentrated overwhelmingly in two IPC subclasses: B29C (shaping of plastics) and B33Y (additive manufacturing). Filing activity is not accelerating. It rose to a peak in 2019 and has since fallen back toward the low double digits, a pattern more consistent with a technology whose core claim space is already staked out than one still opening up.

Resin chemistry shows up as a secondary but substantial layer: addition polymers (C08F) and condensation polymers (C08G) appear in a large minority of records, alongside smaller but non-trivial counts in polymer additives (C08K) and compositions (C08L). Photolithography and exposure-optics claims (G03F) are comparatively rare, which is one of the clearer signals in this dataset about where claim density has not yet caught up with commercial interest.

Filing trend and IPC composition, 2017–2026
  1. 1CARBON INC113
  2. 2POLY MED INC27
  3. 3UNIV OF SOUTHERN CALIFORNIA7
  4. 4AXTRA3D INC6
  5. 5NOVOSET LLC5
  6. 6UNIV OF PITTSBURGH OF THE COMMONWEALTH SYST OF HIGHER EDUCATION5
  7. 7THE REGENTS OF THE UNIVERSITY OF COLORADO4
  8. 8BMF NANO MATERIAL TECHNOLOGY CO LTD3
  9. 9ZITELLI GIANNI2
  10. 10JAMES R GLIDEWELL DENTAL CERAMICS2
Source: Patsnap Eureka. Assignee ranking and totals. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
The Data

Filing trend and technology composition

Two views of the same 184-family dataset: publication activity over time, and how records distribute across the IPC subclasses that define the technology.

A 2019 peak followed by decline

Filings rose from 6 in 2017 to a peak of 62 in 2019, then fell back to 15 by the 2022 midpoint. Because publication lags filing by roughly 18 months, the final one to two years in this trend will fill in somewhat as later applications publish — but the shape of the decline from 2019 predates that lag effect and is unlikely to reverse.

A 2019 peak followed by decline02040608062017201862201920202021202220232024202502026Most recent year is partial — publication lag means later filings are not yet visible.

Concentration in B29C and B33Y

B29C (166 records) and B33Y (165 records) between them touch nearly the entire dataset, confirming this is fundamentally a plastics-shaping and additive-manufacturing claim space. Resin chemistry subclasses (C08F, C08G, C08K, C08L) appear at meaningfully lower counts, and G03F photolithography claims are the thinnest of all at 11 records.

Concentration in B29C and B33YB29C · Shaping of plastics16690.2%B33Y · Additive manufacturing (3D pri…16589.7%C08F · Addition polymers (vinyl etc.)5328.8%C08G · Condensation polymers4122.3%B29K · Plastics moulding materials (i…2212.0%C08K · Use of additives in polymers2212.0%C08L · Polymer compositions2212.0%G03F · Photolithography & photomechan…116.0%Other4222.8%

Shares are the percentage of the 184 records in scope. A patent can carry several IPC classes, so the shares add up to more than 100%.

Source: Patsnap Eureka. Filing trend and technology composition. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.

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This page is one run against one query. Ask Eureka your own question about vat photopolymerization technology landscape and every answer comes back with the patent numbers behind it.

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Key Patents

The most-cited records in this dataset

Representative Filing
US20200070407A12020-03-05

US20200070407A1 — Tough, high temperature polymers produced by stereolithography

CARBON, INC.

The present invention concerns methods of forming a three-dimensional object, and polymerizable liquids such as dual cure resins useful for making a three-dimensional object by stereolithography, such as by continuous liquid interface production (CLIP).Filed by Carbon, Inc., published 2020-03-05. Dual-cure resin chemistry combined with CLIP processing sits at the centre of this filing.

US20200070407A1 — patent drawing 1
View full record
Highest-citation vat photopolymerization patents
#Publication no.Patent titleCitations
1US9975295B2Acceleration of stereolithography22
2US20210229364A1Stereolithography with micron scale control of properties20
3WO2018080397A1A resin formulation and uses thereof20
4WO2020117490A1Window thermal profile calibration in additive manufacturing18
5US20190263070A1Lattice base structures for additive manufacturing18
6WO2018165090A1Tough, high temperature polymers produced by stereolithography18
7WO2019204258A1Temperature regulated stereolithography apparatus with infrared heating17
8US20210155722A1Methods and compositions for photopolymerizable additive manufacturing14
9WO2019195763A1Methods and compositions for photopolymerizable additive manufacturing14
10US20180215093A1Additive manufacturing with high intensity light14

Citation counts reflect influence within the searched corpus and favour older filings; treat them as a signal of what shaped the field, not of what matters most today.

Each row carries its publication number; clicking a row searches Eureka by that number.

Source: Patsnap Eureka. Citation counts and representative records. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
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Insights

What the numbers mean for a filing decision

Three patterns stand out once the raw counts are read against what they imply for where to file and where competitors are already dug in.

Filing Trend
62 in 2019 → 15 by 2022
peak-to-midpoint decline

The core claim space is already staked out

A sharp rise to 2019 followed by a steady fall is the signature of a technology whose foundational process claims — resin formulation, window/interface mechanics, exposure control — were filed early and are not being significantly re-contested. New entrants are more likely to find open ground in adjacent applications than in the core CLIP or DLP process itself.

Based on the 2017–2022 filing trend
Technology Gap
11 of 184 records in G03F
photolithography & exposure optics

Exposure-optics claims are thin relative to process claims

Light-engine design, exposure-pattern control and photomask-adjacent claims sit in G03F, and this subclass is touched by a small fraction of the dataset compared with B29C and B33Y. For teams working on resolution or exposure uniformity, this is one of the more concrete openings in an otherwise dense field.

IPC subclass distribution, G03F vs. B29C/B33Y
Filing Geography
US 94, PCT 36, EPO 27
receiving office counts

US-first filing dominates, PCT is the standard second step

Roughly half of all records were filed with the United States as receiving office, with WIPO PCT applications the next largest group and EPO close behind. China, India and Canada each receive single-digit-to-low-double-digit counts, suggesting freedom-to-operate work outside the US/EU/PCT corridor has had less patent activity to contend with so far.

Receiving office counts across 184 families
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Looking for what nobody has claimed yet?

Eureka can read the same corpus for gaps instead of for coverage: under-claimed branches adjacent to vat photopolymerization technology landscape, with the prior art for and against each one.

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Source: Patsnap Eureka. Co-assignee relationships and derived observations. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
Players

Who holds the claims, and where momentum has stalled

The assignee ranking (rendered separately) sits alongside a set of co-filing relationships and momentum figures that are worth reading together: several of the most active historical filers show zero activity in the latest tracked year.

Co-Filing
3 co-assignee pairs
cross-entity filings

Co-assignee activity is limited and concentrated

Only three co-assignee pairs appear across the dataset. The strongest, Axtra3D Inc with named inventor Gianni Zitelli (5 shared records), suggests a tight founder-linked filing pattern rather than broad industry consortia. A separate pair links Colorado State University's board of governors with the University of Pennsylvania's trustees, pointing to academic collaboration on the research side.

Strongest pair: Axtra3D Inc + Gianni Zitelli, 5 shared records
Momentum
0 in latest year
for several former top filers

Historical leaders have gone quiet

Assignees including Carbon, Inc., Poly-Med, University of Southern California, Axtra3D Inc, the University of Pittsburgh system and Novocite show no filings in the most recent tracked year, with at least one recording a -100% year-on-year drop. Given the 18-month publication lag, some of this is an artefact of timing — but the broader pattern is consistent with the post-2019 filing decline seen across the whole dataset.

Recent-year momentum by assignee
Concentration
184 families, 184 in ranking
full assignee ranking basis

A dense top with a long single-filer tail

The assignee ranking is built on the full family count, and filing activity is not evenly spread: a small number of names — commercial CLIP and DLP developers alongside university tech-transfer offices — account for a disproportionate share of records, with many other assignees appearing only once or twice.

Assignee ranking basis: 184 families
🔍
Under-claimed sub-areas worth watching
Branches where filing density has not kept pace with the core process claims
exposure-optics uniformity controlphotomask-free light engine designdual-cure resin post-processingwindow thermal-profile calibrationhigh-throughput resin dispensing
Rank all filers by momentum →
Recent-year filing momentum by assignee
AssigneeRecent yearYoY
Carbon, Inc.0
Poly-Med, Inc.0-100%
University of Southern California0
AXTRA3D INC0
University of Pittsburgh – Of the Commonwealth System of Higher Education0
Novocite LLC0
ZITELLI GIANNI0
The Board of Governors for Colorado State University0
Source: Patsnap Eureka. Assignee-level momentum. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
What's Next

Where to take this analysis

The dataset points to specific next steps depending on whether the goal is freedom-to-operate, sourcing licensable technology, or scouting where to file next.

Check freedom-to-operate against the most-cited records

The five most-cited patents in this dataset, including US9975295B2 and US20210229364A1, define much of the process and resin-property claim territory. Any new filing in core CLIP or DLP resin chemistry should be checked against these first.

Explore the citation network in Eureka

Map the G03F exposure-optics gap in detail

With only 11 of 184 records touching photolithography and exposure-optics claims, this branch warrants a dedicated search before committing to a filing strategy in light-engine or exposure-pattern design.

Run a targeted subclass search in Eureka

Watch for republication from the 2024–2026 filing gap

Because publication lags filing by about 18 months, the apparent drop-off in the most recent years will partially fill in. Re-run the trend query periodically rather than treating the current low counts as final.

Set up a monitoring alert in Eureka
Source: Patsnap Eureka. Forward-looking reading of the same dataset. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP
FAQ

Common questions about vat photopolymerization patents

Answers are grounded in the same dataset. Derived from a Patsnap search on Vat Photopolymerization Technology Landscape covering 2015–2026, data cut-off 2026-07-31. Counts reflect published records only and shift as new filings publish.Run this in Eureka MCP

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Disclaimer. This page is generated from Patsnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. Patsnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

Machine translation. Assignee and organisation names originally recorded in Chinese, Japanese or Korean have been rendered into English by an AI translation step so that the tables stay readable. These renderings are best-effort and may not match a company’s registered English name; the original name is what the underlying patent record carries, and it is what any Eureka query launched from this page uses.

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