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DED Post-Processing Patent Snapshot 2026

DED Post-Processing Patent Snapshot 2026
Evidence Snapshot
DED Post-Processing Patent Snapshot in 2026

The DED post-processing patent corpus is small and moderately concentrated, with Siemens AG holding the largest single position and Chinese institutions collectively dominating filings. Activity has eased from its 2019 peak, indicating a field that remains early-stage but has not yet attracted broad industrial investment.

12
Patent families in scope
N/A
Concentration not assessed
N/A
Growth trend not assessed
China
Leading jurisdiction
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Published byPatSnap Insights Team··5 min readVerified by PatSnap Eureka data
Overview

Siemens leads a fragmented, China-weighted field

Siemens AG is the clear leader with 3 patent families, placing it ahead of eleven other filers that each hold a single family. The top five filers account for half of the combined output of the ranked applicants visible in this query, pointing to moderate concentration at the very top against a long tail of single-entry participants.

The tier gap between Siemens and all other applicants is stark: no challenger has accumulated more than one family. This means the leader’s position rests on a thin absolute base, and the gap could close quickly if any challenger accelerates its filing program.

Leading applicants
#ApplicantPatent familiesShare
1Siemens AG3
2Nanjing Tech University1
3Xi’an Wusha Mechanical Equipment Co., Ltd.1
4Harbin Institute of Technology1
5NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SAN…1
6Beijing Aerospace Technology Institute1
#ApplicantPatent familiesShare
7Shanghai University of Engineering Science1
8Northwestern Polytechnical University1
9Teraworks Co., Ltd.1
10North University of China1
11Samkee Automotive Co., Ltd.1
12Dalian University of Technology1
↗ Hover a row · click a company to ask Eureka

Siemens’s focus on powder metallurgy subclasses suggests its post-processing work is tightly integrated with its broader additive manufacturing portfolio, giving it a process-level depth that academic filers have not yet matched.

The most recent filing windows are subject to publication lag and likely underrepresent current activity; any apparent slowdown in 20232025 should be treated with caution. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Sporadic annual filings anchored in powder metallurgy and additive manufacturing

The annual trend reveals an irregular, low-volume filing pattern since 2019, while the technology composition chart shows that powder metallurgy and additive manufacturing classes are visible in, with secondary representation in alloys and welding.

Annual filing trend

Filings first appeared in 2019, spiked briefly, then became intermittent through 2024. The 2025 bar appears elevated, but that window falls within the publication-lag period and should not be read as confirmed activity. The overall pattern reflects a field that has not yet reached sustained industrial filing momentum.

Annual filing trendAnnual values from 2017 to 2026, peaking at 6 in 2025.02017020183201902020120211202202023120246202502026↗ Hover for values · click a bar to ask Eureka

Technology composition

B22F (Powder metallurgy) and B33Y (Additive manufacturing) together account for the visible share of classified records, confirming that DED post-processing is framed primarily as an AM process-control problem. C22C (Alloys) ranks third, reflecting material-property optimization as a core sub-theme. Welding, metal working, and turbine classes each appear at lower counts, marking them as adjacent rather than central.

Technology compositionB22F · Powder metallurgy leads with 12; B33Y · Additive manufacturing (3D printing) 11.B22F · Powder metallurgy12B33Y · Additive manufact…11C22C · Alloys8C22F · Non-ferrous metal…4B23K · Welding, solderin…3B23P · Metal working (ge…3F01D · Turbines & non-po…3B22D · Metal casting1↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20250262669A1Published 2025-08-21

High silicon electrical steel alloys using directe…

National Technology & Engineering Solutions Of SANDIA, LLC

Additive manufacturing enables near-net-shape fabrication of high silicon electrical steel alloys. The wide array of process conditions provides additive manufacturing with increased flexibility, enabling control over the microstructure and mechanical properties, compared to conventional rolling and sheet fabrication. As an example of the invention… (excerpt from the patent abstract)

High silicon electrical steel alloys using directe… — patent drawingHigh silicon electrical steel alloys using directe… — patent drawing
Representative drawings from the patent document.
Open this patent in Eureka →
Highly cited patent families surfaced by this query
#PatentCitations
1镍基高温合金构件增材制造方法4
2Manufacturing method of mold comprising conformal …1

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Visible assignees

Assignee snapshot from the current evidence set

The applicants below are visible in this query result. Because the evidence set is relatively small, read this section as a directional snapshot rather than a full competitive ranking.

Leader · Siemens AG

Siemens AG

Siemens AG holds 3 patent families, making it the only filer with a multi-family position. Its technology focus is concentrated in powder metallurgy subclasses (B22F 1, B22F 10, B22F 12), indicating that its post-processing IP is built around material and process control in AM workflows. No momentum trend data is provided for Siemens in the recent-window comparison, but its existing depth gives it a structural lead over all other participants.

families: 3
Challenger · Northwestern Polytechnical University

Northwestern Polytechnical University

Northwestern Polytechnical University holds 1 patent family and is flagged as a new entrant in the most recent filing period. Its technology focus spans powder metallurgy (B22F 10, B22F 9) and additive manufacturing process classes (B33Y 10), consistent with academic process-optimization research. As a new entrant, its trajectory from a small base warrants monitoring; Chinese aerospace-linked universities have historically scaled from exploratory to applied IP quickly.

families: 1
🔍
More assignee evidence is available in Eureka
Use Eureka to validate whether these visible assignees remain central after refining the query scope and adding related patent classes.
Harbin Institute of TechnologySandia National Laboratories (NTESS)+ more
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Source: PatSnap Eureka. Assignee evidence is drawn from the current PatSnap Eureka query. In small evidence sets, applicant counts should be treated as directional signals, not a complete competitive ranking.Explore players →
Frequently asked questions

Frequently asked questions

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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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