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LPBF Interlayer & Substrate Interface Patent Landscape

LPBF Interlayer & Substrate Interface Patent Landscape
Competitive Landscape
LPBF Interlayer & Substrate Interface Patent Landscape in 2026

The LPBF interlayer and substrate interface space comprises 282 patent families and is in a confirmed growth stage, with a 67% increase in recent filings; RTX Corp holds the largest single position while Chinese academic institutions collectively dominate the mid-tier. China is the leading filing jurisdiction, reflecting heavy university-driven activity, while U.S. and European aerospace primes anchor the commercial tier.

282
Patent families in scope
23%
Top-5 share of top-100 filers
+67%
3-yr filing growth (lag-adj.)
China
Leading jurisdiction
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Published byPatSnap Insights Team··7 min readVerified by PatSnap Eureka data
Overview

RTX Corp leads a fragmented field anchored by aerospace primes and Chinese universities

RTX Corp is the single largest filer with 21 patent families, placing it clearly ahead of the next-ranked applicant, Shanghai Jiao Tong University with 11 patent families. The top five filers’ combined share of the hundred largest filers’ total stands at 23%, indicating a moderately fragmented competitive landscape rather than a monopolar one.

A clear two-tier structure is visible: one commercial aerospace prime (RTX Corp) occupies the top position, while the second through fifth ranks are held entirely by Chinese universities. The gap between RTX Corp at 21 patent families and the nearest university challengers is meaningful but not insurmountable, suggesting the leader’s position is based on focused filing rather than overwhelming volume.

Leading applicants
#ApplicantPatent familiesShare
1RTX Corp21
2Shanghai Jiao Tong University11
3NANJING UNIV OF AERONAUTICS & ASTRONAUTICS10
4North University of China (Zhongbei University)9
5South China University of Technology8
6Jiangsu University8
7Ecole Polytechnique Federale de Lausanne (EPFL)7
8Northrop Grumman Systems Corporation7
9National University of Singapore6
10The Boeing Company6
#ApplicantPatent familiesShare
11General Electric Company5
12Wisconsin Alumni Research Foundation5
13Central South University5
14Commissariat a l’Energie Atomique et aux Energies Alternatives (CEA)5
15Dualitas Ltd.4
16Northwestern Polytechnical University4
17The Government of the United States of America3
18UNIV OF SCI & TECH BEIJING3
19Renishaw plc3
20Divergent Technologies Inc.3
↗ Hover a row · click a company to ask Eureka

RTX Corp’s lead implies a proprietary process-control and materials-interface strategy likely tied to turbine and structural aerospace components. China, which may translate into commercial applications or technology transfer in the near term.

Filing counts for 20242026 are understated due to standard patent publication lag; the apparent plateau at the most recent years should not be read as a slowdown. Longer-window growth, applicant concentration, and technology-route coverage are therefore more reliable signals than the latest-year bar alone.

Source: PatSnap Eureka. Chart shows the top applicants ranked by patent families. Applicant counts can overlap where a patent family lists several applicants, so they need not sum to the total in scope.Explore deeper in Eureka →
Trends & Structure

Sustained filing growth with a powder-metallurgy and additive-manufacturing core

Annual filings have risen steadily since 2017, and the technology mix is overwhelmingly concentrated in B22F (powder metallurgy) and B33Y (additive manufacturing), with smaller adjacent clusters in alloys and welding sciences.

Annual filing trend

Filings grew from 10 patent families in 2017 to a recorded high of 60 in 2024, with 2025 and 2026 figures understated due to publication lag. The consistent upward trajectory from 2019 onward reflects broadening commercial interest beyond early research pioneers. The 67% recent-window growth confirms the field is still expanding.

Annual filing trendAnnual values from 2017 to 2026, peaking at 60 in 2024.10201711201817201931202031202132202240202360202442202582026↗ Hover for values · click a bar to ask Eureka

Technology composition

B22F (powder metallurgy) and B33Y (additive manufacturing) each account for the overwhelming majority of IPC classifications, confirming that core LPBF process and materials claims dominate the corpus. C22C (alloys) forms a meaningful secondary cluster, reflecting materials-development activity. Branches such as B23K (welding/soldering), C23C (coating and surface deposition), and C21D (heat treatment) appear at much lower counts, marking them as adjacent and relatively under-served areas.

Technology compositionB22F · Powder metallurgy leads with 278; B33Y · Additive manufacturing (3D printing) 278.B22F · Powder metallurgy278B33Y · Additive manufact…278C22C · Alloys100B23K · Welding, solderin…35B29C · Shaping of plastics34C22F · Non-ferrous metal…19C23C · Coating & surface…17C21D · Heat treatment of…14↗ Hover for values · click a bar to ask Eureka
Source: PatSnap Eureka. Technology-branch counts are measured in patent records; a single patent family can carry several IPC classes, so class totals can exceed the family total in scope.Explore deeper in Eureka →
Key Patents

Highly cited patent families surfaced by the query

Citation-heavy patent families returned by the query. Use this section as citation context, not as a curated list of the most topic-specific patents.

Featured patent
US20250332638A1Published 2025-10-30

Ultrafast laser shock forging assisted laser powde…

Air Force Engineering University

Provided is an ultrafast laser shock forging assisted laser powder bed fusion (LPBF) method with an ultrafast laser to allow on-line control of a stress field for an additive-manufactured component. Technical points of the present disclosure: During a LPBF-based additive manufacturing process, ultra-high-pressure shock waves induced byan ultrafast laser are… (excerpt from the patent abstract)

Ultrafast laser shock forging assisted laser powde… — patent drawingUltrafast laser shock forging assisted laser powde… — patent drawing
Representative drawings from the patent document.
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Highly cited patent families surfaced by this query
#PatentCitations
1Method and system for powder bed fusion additive m…43
2一种制备高性能金刚石/铜复合材料的方法30
3基于激光选区熔化技术制备石墨烯增强铝合金材料的方法29
4一种基于SLM成形的铝基纳米复合材料及其制备方法26
5一种选区激光熔化装置及梯度材料的制备方法22
6一种轮盘式多材料激光选区熔化成型装置与方法22
7一种轮盘式多材料激光选区熔化成型装置与方法21
8Dynamic Holography Non-Scanning Printing Device21

Ranked by total forward citations. Citation counts favour older and broadly cited patent families, and broad or adjacent patents may appear when they match the search scope. Treat this section as citation context, not as a curated list of the most topic-specific patents. Some patent titles may be shown in their original, non-English language where an accurate translation could not be guaranteed.

Source: PatSnap Eureka. Citation-ranked patent families surfaced by this query.Open in Eureka →
Insights

What the competitive structure means for R&D investment decisions

China-dominant filing geography creates a specific set of implications for teams evaluating entry or expansion.

Growth

Growth stage with rising annual volume

The field is classified as Growth, with annual filings still rising according to the lifecycle evidence and a 67% recent-window growth rate. The peak recorded year is 2024, and the evidence does not indicate any easing from that peak, so the upward trajectory is intact. Teams entering now are moving into an active, competitive space rather than a mature one with entrenched positions.

Growth stage
Concentration

Moderate fragmentation with a single commercial leader

The top five filers account for 23% of the hundred largest filers’ combined total, indicating the field is not monopolized. RTX Corp’s lead of 21 patent families is significant but leaves room for challengers. The dense cluster of Chinese universities at ranks 2–6 means that academic IP may be licensable or acquirable, offering an alternative route to capability for commercial entrants.

Fragmented mid-tier
Collaboration

University-industry pairing is the dominant co-filing model

The most active co-filing relationships identified are Zhongbei University with AVIC Beijing Aeronautical Manufacturing Technology Research Institute (2 joint families), and South China University of Technology with Guangdong Huayi Sanitary Ware Industrial Co. and with Sun Yat-sen University Cancer Center (2 joint families each). Shanghai Jiao Tong University co-filed with East China University of Science and Technology, China United Heavy-Duty Gas Turbine Technology Co., and Shanghai Hanbang United 3D Technology Co. These pairings suggest that academic-to-industry knowledge transfer is the primary commercialization pathway in the Chinese segment.

Academic-industry links
Geography

China leads filings; the U.S. and EPO form a meaningful second tier

China is the leading jurisdiction with 132 patent records, reflecting the high volume of university-origin filings. The United States follows with 79 records, and the EPO adds 38, together forming a commercially significant second tier. WIPO PCT filings number 23, indicating a subset of applicants pursuing broader international protection. Teams seeking freedom-to-operate in Western markets should prioritize U.S. and EPO prosecution strategies.

China-dominant
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Top collaboration links
ApplicantCollaboratorCo-filings
North University of China (Zhongbei University)AVIC Beijing Aeronautical Manufacturing Technology Research Institute2
South China University of TechnologyGuangdong Huayi Sanitary Ware Industrial Co., Ltd.2
South China University of TechnologySun Yat-sen University Cancer Center2
Shanghai Jiao Tong UniversityEast China University of Science and Technology1
Shanghai Jiao Tong UniversityChina United Heavy-Duty Gas Turbine Technology Co., Ltd.1
Shanghai Jiao Tong UniversityShanghai Hanbang United 3D Technology Co., Ltd.1
South China University of TechnologyNingbo Zhongke Xianglong Lightweight Technology Co., Ltd.1
South China University of TechnologyNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences1
Jiangsu UniversityWenzhou University Laser and Optoelectronic Intelligent Manufacturing Research Institute1

Co-filing pairs, ranked by the number of jointly-filed patent families.

Source: PatSnap Eureka. Insights are derived from applicant ranking, lifecycle, collaboration, and jurisdiction evidence.Explore insights →
Leaders

RTX Corp anchors the commercial tier; Chinese universities drive volume in the challenger tier

Two distinct profiles define the top of the ranking: a single large aerospace prime with a tightly focused process-and-materials portfolio, and a set of Chinese academic institutions entering with broad LPBF fundamentals coverage.

Leader · RTX Corp

RTX Corp

RTX Corp holds 21 patent families, the largest position in the corpus. Its technology emphasis is concentrated in B22F 10 (powder metallurgy process control) and B33Y 50/10 (additive manufacturing data and process), consistent with a focus on qualifying LPBF-built aerospace components with controlled interlayer properties. Momentum is flagged as a new entrant in the recent filing window, with 20 recent families, indicating that the bulk of RTX Corp’s position has been built rapidly and reflects an active, not legacy, filing program.

patent families: 21
Challenger · Jiangsu University

Jiangsu University

Jiangsu University holds 8 patent families and shows the strongest recent-period momentum among the academic challengers, with 7 recent families and a new-entrant trajectory. Its focus spans B22F 10, B33Y 10, and B33Y 80 (additive manufacturing end-product characterization), suggesting a research program that bridges process optimization and final-part qualification — directly relevant to interlayer and substrate interface performance.

patent families: 8
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Northrop Grumman Systems CorpEPFL (Ecole Polytechnique Federale de Lausanne)+ more
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Leading-applicant momentum (recent 3 yrs, lag-adjusted)
ApplicantRecent (3 yrs)Trend
RTX Corp20▲ new entrant
Shanghai Jiao Tong University4▲ new entrant
Nanjing University of Aeronautics and Astronautics4▲ new entrant
North University of China (Zhongbei University)2▲ new entrant
South China University of Technology3▲ new entrant
Jiangsu University7▲ new entrant
Northrop Grumman Systems Corporation5▲ new entrant
National University of Singapore3▲ new entrant
Source: PatSnap Eureka. Player cards cite patent family counts from the applicant ranking and momentum from recent-period filing data.Explore players →
Adjacent Branches

Under-served branches adjacent to the LPBF interlayer core

Several IPC branches appear at low counts relative to the dominant B22F/B33Y core, pointing to areas where inventive activity has been limited; some carry plausible technical relevance to interlayer and substrate interface challenges.

C23C · Coating & surface deposition

C23C accounts for only 17 patent records — roughly 2% of the IPC classifications observed — despite the direct technical relevance of surface deposition methods to substrate preparation and interlayer adhesion in LPBF builds. Pre-treatment coatings and functionally graded interface layers are active research topics in the broader literature but remain sparsely covered in this corpus. Teams working on substrate surface engineering before or during LPBF could find this branch relatively open, with an entry path through coupling C23C claims to B22F process claims in the same application.

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C21D · Heat treatment of metals

C21D covers only 14 patent records in this corpus, representing approximately 2% of IPC classifications observed, even though post-build and in-situ thermal treatment is a known lever for controlling residual stress and microstructural continuity at interlayer boundaries. The sparsity likely reflects a gap between thermal-processing specialists and LPBF process engineers rather than a lack of technical value. Applicants with dual expertise in alloy metallurgy and LPBF process control could find this branch accessible, particularly for high-temperature aerospace alloys where interlayer cracking is a documented failure mode.

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Unlock the full white-space map
Access the complete adjacent-branch analysis including B23K, B29C, and C22F coverage gaps with entry-path assessments.
B23K · Welding, soldering & brazingC22F · Non-ferrous metal treatment+ more
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Source: PatSnap Eureka. Adjacent branches are identified by low IPC share relative to dominant B22F and B33Y classes.Explore emerging →
Route Matrix

How leading applicants differ by IPC technology route

Route coverage across the main technology branches in the current evidence set.

PlayerB33Y 10 · Additive manufacturing (3D printing)B22F 10 · Powder metallurgyB33Y 70 · Additive manufacturing (3D printing)B33Y 40 · Additive manufacturing (3D printing)B33Y 50 · Additive manufacturing (3D printing)
RTX CorpStrong · 13Strong · 21AbsentAbsentStrong · 18
North University of China (Zhongbei University)Strong · 10Strong · 7Moderate · 5Moderate · 4Emerging · 2
Shanghai Jiao Tong UniversityStrong · 11Strong · 9Moderate · 3Emerging · 2Absent
Nanjing University of Aeronautics and AstronauticsStrong · 10Moderate · 5Strong · 10AbsentAbsent
South China University of TechnologyStrong · 8Strong · 7Moderate · 4Moderate · 4Moderate · 2
Ecole Polytechnique Federale de Lausanne (EPFL)Strong · 5Strong · 5AbsentStrong · 6Absent
National University of SingaporeStrong · 5Strong · 7Moderate · 3AbsentAbsent
Source: PatSnap Eureka. Matrix values are measured in patent records and should not be compared directly with family-level applicant totals.Compare in Eureka →
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Disclaimer. This page is generated from PatSnap Eureka data drawn from a limited snapshot of global patent and scientific-literature records, and is provided for general information and reference only.

Patent data carries inherent limitations: recent filings (typically the most recent 18–24 months) are under-counted due to standard publication lag; counts may be reported at either a patent-family or a patent-record basis and are not always directly comparable; classification, applicant-name, and citation data may contain errors, duplicates, or omissions; and the underlying search query defines and constrains the scope shown. As a result, the analysis may be incomplete or inaccurate and may not reflect the full technology landscape.

Nothing on this page constitutes an exhaustive prior-art, novelty, freedom-to-operate, or validity search, nor does it constitute legal, financial, investment, or professional advice, and it should not be relied upon as such. Any patent, commercial, or strategic decision should be verified independently and reviewed with qualified patent, legal, and domain professionals. PatSnap makes no warranties, express or implied, as to the accuracy, completeness, or fitness for any particular purpose of the information presented.

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